発明者,発明の名称,種別,状態,出願人,出願日,出願番号,公開日,公開番号,登録日,登録番号
"伊藤節郎,細野秀雄,林克郎,戸田喜丈,渡邉　暁,伊藤　和弘,渡邉　俊成,宮川　直通","Ｃ１２Ａ７エレクトライドの薄膜の製造方法、およびＣ１２Ａ７エレクトライドの薄膜","特許","登録","国立大学法人東京工業大学, 旭硝子株式会社, 国立研究開発法人科学技術振興機構","2013/06/19","特願2014-521490","2016/05/26","再表2013/191210","特許第6198276号","2017/09/01"
"林克郎,細野秀雄","マイエナイト複合材および電子放出用陰極","特許","登録","国立大学法人東京工業大学, 国立研究開発法人科学技術振興機構","2012/09/11","特願2012-199624","2014/03/27","特開2014-055313","特許第6062192号","2016/12/22"
"細野秀雄,平野正浩,林克郎,最上　理映,阪口　博之","１２ＣａＯ・７Ａｌ2Ｏ3化合物","特許","登録","国立大学法人東京工業大学, 株式会社ファンケル","2010/06/02","特願2011-518473","2012/11/22","特開（再表）2010-143574","特許第5723771号","2015/04/03"
"細野秀雄,平野正浩,林克郎,最上　理映,阪口　博之","１２ＣａＯ・７Ａｌ2Ｏ3化合物","特許","公開","国立大学法人東京工業大学","2010/06/02","特願2011-518473","2012/11/22","特開（再表）2010-143574",,
"細野秀雄,平野正浩,林克郎,阪口　博之,最上　理英,金　辰也","抗酸化剤及び抗酸化化粧料","特許","登録","国立大学法人東京工業大学, 株式会社ファンケル","2008/11/10","特願2008-287781","2009/07/23","特開2009-161728","特許第5615491号","2014/09/19"
"細野秀雄,平野　正浩,林克郎,阪口　博之,最上　理英,金　辰也","抗酸化剤及び抗酸化化粧料","特許","公開","国立大学法人東京工業大学, 株式会社ファンケル","2008/11/10","特願2008-287781","2009/07/23","特開2009-161728",,
"細野秀雄,林克郎,平野正浩,阪口　博之,最上　理映,金　辰也","抗酸化剤","特許","登録","国立大学法人東京工業大学, 株式会社ファンケル","2007/10/25","特願2008-553958","2010/05/06","特開（再表）2008/087774","特許第5213122号","2013/03/08"
"細野秀雄,林克郎,酒井　崇,松石　聡,平野　正浩,三田村　哲理,松山　博圭","活性酸素を含有したオキシアパタイト及びその製造方法","特許","公開","国立大学法人東京工業大学, 旭化成株式会社","2006/09/05","特願2006-240040","2007/04/12","特開2007-091582",,
"細野秀雄,林克郎,酒井　崇,松石　聡,平野　正浩,三田村　哲理,松山　博圭","活性酸素を含有したオキシアパタイト、その製造方法、及びそれからなる光触媒","特許","登録","国立大学法人東京工業大学, 旭化成株式会社","2006/09/05","特願2006-240041","2007/04/12","特開2007-090341","特許第4766685号","2011/06/24"
"細野秀雄,金　聖雄,林克郎,村松　利光","複合金属酸化物及び導電性複合金属酸化物の製造方法","特許","公開","国立大学法人東京工業大学, 関西ペイント株式会社","2006/07/05","特願2006-185804","2008/01/24","特開2008-013396",,