Japanese
Home
Search
Horizontal Search
Publication Search
( Advanced Search )
Patent Search
( Advanced Search )
Research Highlight Search
( Advanced Search )
Researcher Search
Search by Organization
Support
FAQ
T2R2 User Registration
Doctoral thesis registration
Support/Contact
About T2R2
What's T2R2?
Operation Guidance
Leaflets
About file disclosure
Related Links
Science Tokyo
STAR Search
NII IR Program
Home
>
Help
Publication Information
Title
Japanese:
English:
Comparison of Sulfonation Efficiency of Plasma Treatments between Dielectric Barrier Discharge and DC Discharge
Author
Japanese:
YAO Kaixun
,
高橋 克幸
,
立花 孝介
,
兒玉 学
, LI Oi Lun,
竹内 希
.
English:
YAO Kaixun
,
高橋克幸
,
立花孝介
,
兒玉学
, LI Oi Lun,
竹内希
.
Language
English
Journal/Book name
Japanese:
English:
Volume, Number, Page
Published date
Jan. 23, 2025
Publisher
Japanese:
English:
Conference name
Japanese:
誘電・絶縁材料/放電・プラズマ・パルスパワー/高電圧 合同研究会
English:
Conference site
Japanese:
沖縄県
English:
©2007
Institute of Science Tokyo All rights reserved.