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タイトル
和文: 
英文:Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method 
著者
和文: 北野 政明, Takeshi Kudo, 松岡 雅也, 植嶌 陸男, 安保 正一.  
英文: Masaaki Kitano, Takeshi Kudo, Masaya Matsuoka, Michio Ueshima, Masakazu Anpo.  
言語 English 
掲載誌/書名
和文: 
英文:Materials Science Forum 
巻, 号, ページ Vol. 544-545        pp. 107-110
出版年月 2007年3月 
出版者
和文: 
英文:Trans Tech Publications Ltd 
会議名称
和文: 
英文: 
開催地
和文: 
英文: 
アブストラクト Highly nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts were prepared by aradio-frequency magnetron sputtering (RF-MS) deposition method. N-TiO2 thin films with lownitrogen concentration (0.5%) exhibited a small absorption band as a shoulder in the 400-500 nmwavelength region, indicating that isolated N 2p orbitals are formed above the O 2p orbitals.However, N-TiO2 with higher nitrogen concentration (6%) exhibited a sharp absorption edge at 500nm, indicating that visible light absorption is due to a band gap transition. These N-TiO2 thin filmscould operate as photocatalysts to decompose 2-propanol diluted in water under visible light. Theband structure of N-TiO2 was also determined by photoelectrochemical measurements and H2 and O2evolution was carried out from an aqueous solution involving sacrificial reagents.

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