The authors developed a new analysis technique for atomic disorder structures in full-Heusler alloys
using x-ray diffraction XRD with Co K and Cu K sources. The technique can quantitatively
evaluate all the atomic disorders for the exchanges between X, Y, and Z atoms in full-Heusler X2YZ
alloys. In particular, the technique can treat the DO3 disorder that cannot be analyzed by ordinary
Cu K XRD. By applying this technique to full-Heusler Co2FeSi alloy thin films formed by rapid
thermal annealing RTA, RTA-temperature TA dependence of the atomic disorders was revealed.
The site occupancies of Co, Fe, and Si atoms on their original sites were 98%, 90%, and 93%,
respectively, for the film formed at TA=800 °C, indicating that the RTA-formed Co2FeSi film had
the L21 structure with the extremely high degree of ordering.
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