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タイトル
和文: 
英文:Fully autonomous materials screening methodology combining first-principles calculations, machine learning and high-performance computing system 
著者
和文: 高橋 亮, 寺山 慧, 熊谷 悠, 田村 亮, 大場 史康.  
英文: Akira Takahashi, Kei Terayama, Yu Kumagai, Ryo Tamura, Fumiyasu Oba.  
言語 English 
掲載誌/書名
和文: 
英文:Science and Technology of Advanced Materials: Methods 
巻, 号, ページ Vol. 3    No. 1    2261834
出版年月 2023年10月4日 
出版者
和文: 
英文:Taylor & Francis 
会議名称
和文: 
英文: 
開催地
和文: 
英文: 
公式リンク https://doi.org/10.1080/27660400.2023.2261834
 
DOI https://doi.org/10.1080/27660400.2023.2261834
アブストラクト Materials screening by high-throughput first-principles calculations is a powerful tool for exploring novel materials with preferable properties. Machine learning techniques are expected to accelerate materials screening by constructing surrogate models and making fast predictions. Especially, black-box optimization methods such as Bayesian optimization, repeating the construction of a prediction model and the selection of data points, have attracted much attention. In this study, we constructed an autonomous materials screening system using first-principles calculations and machine learning working on high-performance computing systems. The performance of the system was evaluated by applying the system to the exploration of high-k dielectrics using band gaps by hybrid functional calculations and dielectric constants by density functional perturbation theory calculations, respectively. The developed system identified materials with anomalous properties, as well as materials with both wide band gaps and high dielectric constants by utilizing appropriate black-box optimization methods, much faster than random exploration. The code for the developed system is published on an open repository.

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