"Shimpei Yamaguchi","Threshold voltage control technology in metal/high-k pFET consisting of high germanium content SiGe channel and fixed charge/oxygen vacancy control in gate stack",,,,,,,2018,Sept. "Shimpei Yamaguchi","Threshold voltage control technology in metal/high-k pFET consisting of high germanium content SiGe channel and fixed charge/oxygen vacancy control in gate stack",,,,,,,2018,Sept. "Shimpei Yamaguchi","Threshold voltage control technology in metal/high-k pFET consisting of high germanium content SiGe channel and fixed charge/oxygen vacancy control in gate stack",,,,,,,2018,Sept. "c דT,R W,勴 ,@c ɗ,p MV, ꐶ, ","Resistivity Reduction of Low-Carrier-Density Sputtered-MoS2 Film using Fluorine Gas","International Workshop on Junction Technology",,,,,,2017,June