"Kanetake Takasaki,Kiyoshi Irino,Takayuki Aoyama,Youichi Momiyama,Toshiro Nakanishi,Yasuyuki Tamura,Takashi Ito","Impact of Nitrogen Profile in Gate Nitrided-Oxide on Deep-Submicron CMOS Performance and Reliability",,"Fujitsu Sci. and Tech. Jour.","Fujitsu","Vol. 39","No. 1","pp. 40-51",2003,Jan.
"Kanetake Takasaki,Kiyoshi Irino,Takayuki Aoyama,Youichi Momiyama,Toshiro Nakanishi,Yasuyuki Tamura,Takashi Ito","Impact of Nitrogen Profile in Gate Nitrided-Oxide on Deep-Submicron CMOS Performance and Reliability",,"FUJITSU SCIENTIFIC & TECHNICAL JOURNAL","Fijitsu","Vol. 39","No. 1","pp. 40-51",2003,