"Rinji Sugino,Takashi Ito","The formation, imaging, and application of thin silicon-dioxide membrane",,"Electrochimica Acta","Electrochimica Acta","Vol. 54",,"pp. 5965-6118",2009,Oct.
"Takashi Ito,Rinji Sugino","Micro- and Nano-Cavity Formation on Silicon by   Using A Very Thin Native-Oxide Membrane","The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008)","The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008)","The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008)",,,"p. 81",2008,Sept.
"杉野林志,Unsoon Kim,Kyunghoon Min,Ning Chen,Huaqiang Wu,Chungho Lee,Fred Cheung,Hiroyuki Kinoshita,上西雅彦,加藤寿,多田新吾,伊藤隆司","塩素ガスエッチングを用いた微細MOS Elevated Source/Drain プロセス",,"電子情報通信学会論文誌C","(社)電子情報通信学会","Vol. J91-C","No. 7","pp. 363-369",2008,July
"Rinji Sugino,Takashi Ito","A Formation of Si Native Oxide Membrane Using High-Selectivity Etching and Application for Nano-Pipe Array and Micro-Diaphragm on Si Substrate","Technical Digest of International Electron Devices Meeting (IEDM2006)","Technical Digest of International Electron Devices Meeting (IEDM2006)","Technical Digest of International Electron Devices Meeting (IEDM2006)","Vol. 19.6.1",,"pp. 529-532",2006,Dec.
"伊藤隆司,杉野林志,石川健治","ライ洗浄技術―半導体製造―",,"精密工学会誌","社団法人精密工学会","Vol. 70","No. 7","pp. 894-897",2004,July
"Takashi Ito,Rinji Sugino","Dry Cleaning Technologies Using UV-Excited   Radicals and Cryogenic Aerosols",,"Solid State Phenomena",,"Vol. 65-66",,"pp. 219-224",1999,July
"Takashi Ito,Rinji Sugino","Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols","Proc. Fourth Int. Symp. on Ultra Clean Processing of Silicon Surfaces","Proc. Fourth Int. Symp. on Ultra Clean Processing of Silicon Surfaces",,,,"pp. 219-224",1998,
"Rinji Sugino,Yoshiko Okui,Mayumi Shigeno,Satoshi Okuno,Kanetake Takasaki,Takashi Ito","Dry Cleaning for Fe Contaminants on Si and SiO2   Surfaces with Silicon Chlorides",,"J. Electrochem. Soc.",,"Vol. 114","No. 11","pp. 3984-3988",1997,
"Rinji Sugino,Takashi Ito","Removal of Fe Contaminants in SiO2 Layers with Successive Processing of Poly-Si Deposition and Cl-Radical Etching",,"J. Electrochem. Soc.",,"Vol. 114","No. 11","pp. 4059-4061",1997,
"Rinji Sugino,Toshiro Nakanishi,Kanetake Takasaki,Takashi Ito","Identification of MOS Gate Dielectric Breakdown Spot Using High Selectivity Cl Radical Etching Technique",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 143","No. 8","pp. 2691-2694",1996,Aug.
"杉野林志,奈良安雄,渡辺悟,伊藤隆司","光励起塩素ラジカルを用いたシリコンのエッチングとクリーニング",,"電気化学および工業物理化学","電気化学会","Vol. 56","No. 7","pp. 533-537",1988,July