"Shinpei Hijiya,Takashi Ito,Masaichi Shinoda","Dual Dielectric Nonvolatile Memory Cells with Thermally Grown Silicon Nitride Films",,"Fujitsu Scientific and Technical Journal.","Fujitsu Ltd.","Vol. 16","No. 3","pp. 115-121",1980,Sept.
"Takashi Ito,Shinpei Hijiya,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda","Low Voltage Alterable EAROM Cells with Nitride-Barrier Avalanche Injection MIS(NAMIS)",,"IEEE TRANSACTIONS ON ELECTRON DEVICES","IEEE Electron Devices Society","Vol. ED-26","No. 6","pp. 906-913",1979,
"Takashi Ito,Shinpei Hijiya,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda,Yukio Fukukawa","Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 125","No. 3","pp. 448-452",1979,
"Takashi Ito,Shinpei Hijiya,Hidetoshi Nishi,Masaichi Shinoda,Toshio Furuya","Interfacial Doping by Recoil Implantation for Nonvolatile Memories",,"Japanese Journal of Applied Physics. Supplement","The Japan Society of Applied Phisics","Vol. 17-1",,"pp. 201-206",1978,
"Takashi Ito,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda","Thermally Grown Silicon Nitride Films for High Performance MNS Devices",,"Applied Phisics Letters","American Institute of Physics","Vol. 32","No. 5","pp. 330-331",1978,
"Takashi Ito,Shinpei Hijiya,Hidetoshi Nishi,Masaichi Shinoda,Toshio Furuya","Interfacial Doping by Recoil Implantation for Nonvolatile Memories","Ext. Abs. on 9th Conf: on SSDM","Ext. Abs. on 9th Conf: on SSDM",,,,"pp. 61-62",1977,
"Takashi Ito,Shinpei Hijiya,Hajime Ishikawa,Masaichi Shinoda","0V Write/Erase EAROM Cells with Directly Nitrided Silicon Nitride Films as First  Insulating Layers","Tech. Dig. of IEDM","Tech. Dig. of IEDM",,,,"pp. 284-286",1977,
"Takashi Ito,Takao Nozaki,Hideki Arakawa,Shinpei Hijiya,Masaichi Shinoda,Yukio Fukukawa","Thermally Nitrided Silicon Films By Direct Reaction","Abs. of 150th ECS Fall Meeting","Abs. of 150th ECS Fall Meeting",,,,"p. 310",1976,