"Takashi Kato,Takashi Ito","Interfacial Oxidation of Silicon Substrates through Ta2O5",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 135","No. 10","pp. 2586-2590",1988,Oct.
"Takashi Kato,Takashi Ito,Mamoru Maeda","Chemical Vapor Deposition of Aluminum Enhanced by Magnetron-Plasma",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 135","No. 2","pp. 455-459",1988,Feb.
"Takashi Kato,Takashi Ito,Hajime Ishikawa","In Situ,Carbon-Doped Aluminum Metallization for VLSI/ULSI Interconnection","Tech. Dig. of IEDM","Tech. Dig. of IEDM",,,,"pp. 458-460",1988,
"Masaru Muto,Takashi Kato,Takashi Ito,Hajime Ishikawa","ZrSi2 for LSI Contat System","Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli.","Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli.",,,,"pp. 143-144",1985,
"Masaru Muto,Takashi Kato,Takashi Ito,Hajime Ishikawa","Self-aligned  Silicidation of Zr and Its Comparison with Ti","Ext. Abst. of 17th Conf. on SSDM","Ext. Abst. of 17th Conf. on SSDM",,,,,1985,
"Takashi Kato,Takashi Ito,Masao Taguchi,Tetsuo Nakamura,Hajime Ishikawa","Interfacial Oxidation of Ta205-Si Systems for High Density DRAM","Dig. of Tech. Papers on 1983 Symp. on VLSI Tech.","Dig. of Tech. Papers on 1983 Symp. on VLSI Tech.",,,,"pp. 86-87",1983,