"Masaru Muto,Takashi Kato,Takashi Ito,Hajime Ishikawa","ZrSi2 for LSI Contat System","Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli.","Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli.",,,,"pp. 143-144",1985,
"Masaru Muto,Takashi Kato,Takashi Ito,Hajime Ishikawa","Self-aligned  Silicidation of Zr and Its Comparison with Ti","Ext. Abst. of 17th Conf. on SSDM","Ext. Abst. of 17th Conf. on SSDM",,,,,1985,