"Fumitoshi Sugimoto,Hiroshi Horie,Yoshihiro Arimoto,Takashi Ito","A pH-Controlled Chemical Mechanical Polishing Method for Thin Bonded Silicon-on-Insulator Wafers",,"Japanese Journal of Applied Physics","The Japan Society of Applied Phisics","Vol. 34","No. 1","pp. 30-35",1995,Jan.
"Kunihiro Suzuki,Tetsu Tanaka,Yoshiharu Tosaka,Hiroshi Horie,Yoshihiro Arimoto,Takashi Ito","Analytical Surface Potential Expression for Thin Film Double-Gate SOI MOSFETs",,"Solid-State Electron","ELSEVIER","Vol. 37","No. 2","pp. 327-332",1994,Feb.
"Rinshi Sugino,Yasuo Nara,Hiroshi Horie,Takashi Ito","Ultraviolet Excited Cl-Radical Etching of Si Through Native Oxides",,"Journal of Applied Physics","American Institute of Physics","Vol. 76","No. 9","pp. 5498-5502",1994,Feb.
"Yoshihiro Arimoto,Hiroshi Horie,Naoshi Higaki,Manabu Kojima,Fumitoshi Sugimoto,Takashi Ito","Advanced Metal Oxide Semiconductor and Bipolar Devices on Bonded Silicon-on-Insulators",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 140","No. 4","pp. 1138-1143",1993,Apr.
"Kunihiro Suzuki,Tetsu Tanaka,Hiroshi Horie,Yoshihiro Arimoto,Takashi Ito","Analytical Surface Potential Expression for Double-Gate SOI MOS FETS","Proc. Int. Workshop on VLSI Process and Device Modeling","Proc. Int. Workshop on VLSI Process and Device Modeling",,,,"pp. 150-151",1993,
"Fumio Sugimoto,Hiroshi Horie,Yoshihiro Arimoto,Takashi Ito","A pH-  Controlled Chemical Mechanical Polishing Method for Ultra-Thin Bonded SOI  Wafer","Dig. of Tech. Papers, Symp. on VLSI Tech.","Dig. of Tech. Papers, Symp. on VLSI Tech.",,,,"pp. 113-114",1993,
"Takashi Ito,Hiroshi Horie,Tetsu Fukano,Hajime Ishikawa","A Nitride-Isolated Molybdenum-Polysilicon Gate Electrode for MOS VLSI Circuits",,"IEE Trans Electron Devices","IEEE Electron Devices Society","Vol. ED-33","No. 4","pp. 464-468",1986,Apr.
"Takashi Ito,Hiroshi Horie,Tetsu Fukano,Hajime Ishikawa","A Nitride Isolated Molybdenum-Polysilicon Gate Electrode","Dig. of Tech. Papers on 1985 Symp. on VLSI Tech.","Dig. of Tech. Papers on 1985 Symp. on VLSI Tech.",,,,"pp. 60-61",1985,
"Hiroshi Horie,Tetsu Fukano,Takashi Ito,Hajime Ishikawa","Multiple Self-Alignment MOS Technology (MUSA/MOS)","Tech. Dig. of IEDM","Tech. Dig. of IEDM",,,,"pp. 398-401",1984,