"—‹ ˆê–Â,Shu Munekiyo,Kuniyuki KAKUSHIMA,Takamasa Kawanago,Yoshinori Kataoka,Akira Nishiyama,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI,M. Furuhashi,N. Miura,S. Yamakawa","Interface reaction analysis of La2O3/SiC upon annealing by ATR-FTIR","The Workshop on Future Trend of Nanoelectronics:WIMNACT 39, February 7, 2014, Suzukake Hall, Suzukakedai Campus, Tokyo Institute of Technology, Japan",,,,,,2014,
"—‹ ˆê–Â,�@�´�C,Šp“ˆ–M”V,�ì“ߎq�‚’¨,•Ð‰ª�D‘¥,�¼ŽR�²,�™ˆä�M”V,Žá—Ñ�®,“›ˆäˆê�¶,–¼ŽæŒ¤“ñ,Šâˆä—m,ŒÃ‹´ ‘s”V,ŽO‰Y �¬‹v,ŽR�ì ‘�","ATR-FTIR–@‚ð—p‚¢‚½”M�ˆ—�‚É‚æ‚éLa2O3/SiCŠE–Ê”½‰ž‚̉ð�Í","‘æ61‰ñ‰ž—p•¨—�Šw‰ï�t‹GŠw�p�u‰‰‰ï",,,,,,2014,