"Huang Tao,Reika Katsumata","Large Area Fabrication of Graphene Nanoribbons by Wetting Transparency-Assisted Block Copolymer Lithography",,"POLYMER",,,,,2017,Feb. "扇澤敏明,勝又麗香","高分子溶液からのフィルム形成過程における表面・界面の固化現象と残留応力発生メカニズム",,"高分子の残留応力対策","技術情報協会",,,"pp. 317-323",2017,Feb. "Reika Katsumata,Keiichi Kuboyama,Toshiaki Ougizawa","Solidification process of polymer solution coating in surface and interfacial region","The 3rd Asian Coating Workshop","The 3rd Asian Coating Workshop",,,,,2011,July "藤巻彩菜,勝又麗香,久保山敬一,扇澤敏明","溶媒キャストフィルムにおける光学異方性から観た基板界面の分子鎖構造","接着学会第49回年次大会","第49回日本接着学会年次大会講演要旨集",,,,,2011,June "勝又 麗香,阿多 誠介,久保山 敬一,扇澤 敏明","高分子溶液のキャスト成膜における表面・界面の固化現象","第22回プラスチック成形加工学会年次大会","成形加工学会年次大会年次大会予稿集",,,,"p. 329-330",2011,June "勝又麗香,阿多誠介,久保山敬一,扇澤敏明","高分子の溶媒成膜過程における表面・界面の固化現象","第60回高分子学会年次大会","高分子学会予稿集",,"Vol. 60","No. 1",,2011,May "Reika Katsumata,Seisuke Ata,Keiichi Kuboyama,Toshiaki Ougizawa","Origin of Residual Stress and Ways to Reduce It in Solvent Cast Polymer Film","The 15th International Coating Science and Technology Symposium","The 15th International Coating Science and Technology Symposium Final Program and Extended Abstracts",,,,"p. 156",2010,Sept. "勝又 麗香,阿多 誠介,久保山 敬一,扇澤 敏明","溶媒キャストフィルムの成膜過程における残留応力発現メカニズム","第59回高分子学会年次大会","高分子学会予稿集","高分子学会","Vol. 59","No. 1","p. 771",2010,May "勝又麗香,阿多誠介,久保山敬一,扇澤敏明","溶媒キャストフィルムにおける残留応力発生メカニズムと軽減に関する研究","成形加工シンポジア'09","成形加工シンポジア","プラスチック成形加工学会",,,"pp. 31-32",2009,Nov. "勝又麗香,阿多誠介,久保山敬一,扇澤敏明","溶媒キャストフィルムにおける残留ひずみ発現メカニズムとその軽減に関する研究","第58回高分子学会年次大会","高分子学会予稿集","高分子学会","Vol. 58","No. 1","p. 658",2009,May