@article{CTT100769727,
  author = {Tomoya Sato and Daichi Ichinose and Takaaki Inoue and Mutsuo Uehara and Kiriha Katayama and Hiroshi Funakubo and Kiyoshi Uchiyama},
  title = {Evaluation of Chemical Stability in Perovskite-Type Proton-Conductive Oxide Thin-Films},
  journal = {Science of Advanced Materials},
  year = 2018,
}

@inproceedings{CTT100771559,
  author = {Takanori Mimura and Kiriha Katayama and Takao Shimizu and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness-dependent phase stability of epitaxial ferroelectric HfO2-based films},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771521,
  author = {Takanori Mimura and Kiriha Katayama and Takao Shimizu and Takanori Kiguchi and Akihiko Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Stability of Ferroelectric Phase in Epitaxial HfO2-based Films},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100722284,
  author = {白石貴久 and 中村奨梧 and 範滄宇 and 片山きりは and 清水荘雄 and 舟窪浩 and 木口賢紀 and 今野豊彦},
  title = {酸化物薄膜の構造解析～HfO2基極薄膜の斜方晶相について～},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100721043,
  author = {舟窪浩 and 清水荘雄 and 片山きりは and 三村和仙 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 内田寛},
  title = {配向制御したHfO2基強誘電体の作製とその強誘電特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722311,
  author = {三村和仙 and 片山きりは and 清水荘雄 and 内田 寛 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪 浩},
  title = {固相成長による配向制御したHfO2基強誘電体薄膜の作製と特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722299,
  author = {陳 舟 and 平永良臣 and 清水荘雄 and 片山きりは and 三村和仙 and 舟窪 浩 and 長 康雄},
  title = {走査型非線形誘電率顕微鏡における強誘電性Y:HfO2薄膜のドメイン反転},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722209,
  author = {片山きりは and 清水荘雄 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 内田寛 and 舟窪浩},
  title = {HfO2 基エピタキシャル薄膜における強誘電相の安定化},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722208,
  author = {三村和仙 and 片山きりは and 清水荘雄 and 舟窪浩 and 内田寛 and 木口賢紀 and 赤間章裕 and 今野豊彦},
  title = {固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722288,
  author = {陳舟 and 平永良臣 and 清水荘雄 and 片山きりは and 三村和仙 and 舟窪浩 and 長康雄},
  title = {強誘電性Y:HfO2薄膜におけるナノスケールドメイン反転},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722193,
  author = {Takao Shimizu and Kiriha Katayama and Takahisa Shiraishi and Takanori Kiguchi and Shogo Nakamura and Toyohiko Konno and Hiroshi Funakubo},
  title = {Ferroelectricity in HfO2-based epitaxial thin film},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721776,
  author = {Takao Shimizu and Kiriha Katayama and Tatsuhiko Yokouchi and Takahiro Oikawa and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko Konno and Hiroshi Uchida and Hiroshi Funakubo},
  title = {Preparation of Fluorite-Structured Ferroelectric Thin Films and Their Characterization},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721753,
  author = {中村奨梧 and 木口賢紀 and 白石貴久 and 範 滄宇 and 今野豊彦 and 片山きりは and 清水荘雄 and 舟窪 浩},
  title = {斜方晶ハフニア薄膜の強誘電相構造},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721745,
  author = {白石貴久 and 片山きりは and 横内達彦 and 清水荘雄 and 及川貴弘 and 内田 寛 and 舟窪 浩 and 木口賢紀 and 今野豊彦},
  title = {種々の基板上に作製した (Hf0.5Zr 0.5)O2薄膜の特性},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721708,
  author = {清水 荘雄 and 片山 きりは and 木口 賢紀 and 赤間 章裕 and 今野 豊彦 and 内田 寛 and 坂田 修身 and 舟窪 浩},
  title = {斜方晶エピタキシャルHfO2基薄膜のドメイン構造},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721000,
  author = {舟窪 浩 and 白石 貴久 and 片山 きりは and 横内 達彦 and 清水 荘雄 and 及川 貴弘 and 内田 寛},
  title = {(Hf0.5Zr0.5)O2 薄膜の強誘電性に及ぼす歪の効果},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721727,
  author = {中村奨梧 and 範滄宇 and 白石貴久 and 木口賢紀 and 今野豊彦 and 片山きりは and 清水荘雄 and 横内達彦 and 及川貴弘 and 舟窪浩},
  title = {ABF-STEM 法を用いた斜方晶HfO2の分極構造の解析},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721710,
  author = {片山 きりは and 清水 荘雄 and 木口 賢紀 and 赤間 章裕 and 今野 豊彦 and 内田 寛 and 坂田 修身 and 舟窪 浩},
  title = {Si基板上への斜方晶エピタキシャルHfO2基薄膜の作製},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721172,
  author = {K. Katayama and T. Shimizu and O. Sakata and T. Kiguchi and A. Akama and T. J. Konno and S. Nakamura and H. Uchida and H. Funakubo},
  title = {Growth and structural analysis of epitaxial orthorhombic YO1.5-HfO2 thin films},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721055,
  author = {片山きりは and 清水荘雄 and 白石貴久 and 及川貴弘 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 中村奨梧 and 内田 寛 and 舟窪 浩},
  title = {斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価},
  booktitle = {},
  year = 2015,
}

@inproceedings{CTT100721053,
  author = {阿部千穂子 and 塩川真里奈 and 片山きりは and 白石貴久 and 清水荘雄 and 舟窪 浩 and 内田 寛},
  title = {CSD 由来HfO2-ZrO2 固溶体薄膜の結晶構造と誘電特性},
  booktitle = {},
  year = 2015,
}

@misc{CTT100753371,
  author = {清水荘雄 and 舟窪浩 and 片山きりは and 三村和仙},
  title = {強誘電性薄膜、電子素子及び製造方法},
  howpublished = {登録特許},
  year = 2020,
  month  = {},
  note   = {特願2016-545654(2015/08/28), 再表2016/031986(2017/06/15), 特許第6661197号(2020/02/14)}
}