論文

• Bin Huang, Yasuhiro Takimoto, Masato Watanabe, Eiki Hotta. Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source, Japanese Journal of Applied Physics, The Japan Society of Applied Physics, Vol. 50, June 2011.

国際会議発表 (査読有り)

• B. Huang, Y. Takimoto, M. Watanabe, E. Hotta. Xe-based Gas Jet Type Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithography, 23rd International Microprocesses and Nanotechnology Conference, 12D-11-1, Nov. 2010.
• Bin Huang, Yasuhiro Takimoto, Masato Watanabe, Eiki Hotta. Xe-based Z-pinch gas jet type DPP EUV source for lithography, Joint Technical Meeting on Plasma Science and Pulsed Power Technology, The Papaers of Joint Technical Meeting on Plasma Science and Pulsed Power Technology, IEEJ, PST-10-034, PPT-10-055, Aug. 2010.

国内会議発表 (査読有り)

• Bin Huang, Bin Xie, Fei Jiang, Taku Tomizuka, Yasuhiro Takimoto, Masato Watanabe, Feng Xiao, Eiki Hotta. Numerical study of the initial gas distribution on a gas jet plasma EUV source, 2011 Annual Conference of Fundamentals and Materials Society IEE Japan, Proceedings of 2011 Annual Conference of Fundamentals and Materials Society IEE Japan, IEE Japan, CD, Sept. 2011.

国際会議発表 (査読なし・不明)

• Eiki Hotta, Yusuke Sakai, Zhu Qiushi, Yuya Ishizuka, Yasuhiro Takimoto, Huang Bin, Masato Watanabe. R&D of EUV and SXR Light Sources at Tokyo Institute of Technology, 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and the 10th Chinese-Russian Symposium on Laser Physics and Laser Technologies, 2010 Academic Symposium on Optoelectronics and Microelectronics Technology and the 10th Chinese-Russian Symposium on Laser Physics and Laser Technologies, Harbin Institute of Technology, CD, July 2010.

国内会議発表 (査読なし・不明)

• Y. Takimoto, Huang Bin, O. Sakuchi, M. Watanabe, E. Hotta. Study of a Gas Jet Type Z-pinch EUV Light Source, Frontiers of Particle Beam and High Energy Density Plasma Science using Pulse Power Technology, Frontiers of Particle Beam and High Energy Density Plasma Science using Pulse Power Technology, NIFS, NIFS-PROC-87, pp. 1-5, Apr. 2011.
• 滝本泰大, 黄 斌, 渡邊正人, 堀田栄喜. 同軸2重円筒ノズル型電極を用いたガスジェット型放電生成プラズマ光源に関する研究, プラズマ／パルスパワー合同研究会, 電気学会研究会資料, 電気学会, PST-10-79/PPT-10-99, pp. 63-65, Dec. 2010.
• 渡邊正人, 酒井雄祐, 朱 秋石, 黄 斌, 石塚裕也, 滝本泰大, 堀田栄喜. 低気圧放電プラズマを用いた短波長光源の開発, 平成22年電気学会基礎・材料・共通部門大会, 平成22年電気学会基礎・材料・共通部門大会, 電気学会, CD, Sept. 2010.
• Bin Huang, Yasuhiro Takimoto, Masato watanabe, Eiki Hotta. Xe-based Z-pinch Discharge Produced Plasma (DPP) EUV Source for Lithograph, Technical Meeting on Pulsed Power Technology, The papers of Technical Meeting on Pulsed Power Technology, IEE Japan, PPT-10-23, pp. 15-18, Feb. 2010.

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