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瀬下武広 研究業績一覧 (8件)
論文
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Shinsuke Maekawa,
Lander Verstraete,
Hyo Seon Suh,
Takehiro Seshimo,
Takahiro Dazai,
Kazufumi Sato,
Kan Hatakeyama,
Yuta Nabae,
Teruaki Hayakawa.
High-Fidelity Directed Self-Assembly Using Higher-chi Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features,
Advanced Functional Materials,
John Wiley & Sons, Ltd,
Vol. n/a,
No. n/a,
pp. 2421066,
Jan. 2025.
公式リンク
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Riku Mizusaki,
Shinsuke Maekawa,
Takehiro Seshimo,
Takahiro Dazai,
Kazufumi Sato,
Kan Hatakeyama-Sato,
Yuta Nabae,
Teruaki Hayakawa.
Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella,
RSC Applied Interfaces,
RSC,
Vol. 2,
No. 1,
pp. 74-81,
Aug. 2024.
公式リンク
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Shinsuke Maekawa,
Takehiro Seshimo,
Takahiro Dazai,
Kazufumi Sato,
Kan Hatakeyama,
Yuta Nabae,
Teruaki Hayakawa.
Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly,
Nature Communications,
Vol. 15,
No. 1,
pp. 5671,
July 2024.
公式リンク
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Lei Dong,
Rin Odashima,
Takehiro Seshimo,
Yuta Nabae,
Teruaki Hayakawa.
Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers,
Journal of Photopolymer Science and Technology,
Vol. 32,
No. 6,
pp. 817-822,
Nov. 2019.
学位論文
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Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,
Thesis,
Doctor (Engineering),
Tokyo Institute of Technology,
2016/03/26,
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Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,
Exam Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2016/03/26,
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Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,
Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2016/03/26,
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Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,
Outline,
Doctor (Engineering),
Tokyo Institute of Technology,
2016/03/26,
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