@inproceedings{CTT100608342,
  author = {Han Hui-Seong and Takahiro Sano and Young uk Song and Shun-ichiro Ohmi},
  title = {Electrical Properties of Hf/HfSiON/p-Si(100) Structure MIS capacitor by Using ECR-Sputtering},
  booktitle = {春季第５７回応用物理学関係連合講演会予稿集},
  year = 2010,
}

@misc{CTT100660583,
  author = {Hui-seong Han},
  title = {A study on ultrathin hafnium nitride gate insulator formed by ECR plasma sputtering},
  year = 2013,
}

@misc{CTT100660585,
  author = {Hui-seong Han},
  title = {A study on ultrathin hafnium nitride gate insulator formed by ECR plasma sputtering},
  year = 2013,
}

@misc{CTT100673659,
  author = {Hui-seong Han},
  title = {A study on ultrathin hafnium nitride gate insulator formed by ECR plasma sputtering},
  year = 2013,
}



@phdthesis{CTT100660583,
  author = {Hui-seong Han},
  title = {A study on ultrathin hafnium nitride gate insulator formed by ECR plasma sputtering},
  school = {東京工業大学},
  year = 2013,
}

@phdthesis{CTT100660585,
  author = {Hui-seong Han},
  title = {A study on ultrathin hafnium nitride gate insulator formed by ECR plasma sputtering},
  school = {東京工業大学},
  year = 2013,
}

@phdthesis{CTT100673659,
  author = {Hui-seong Han},
  title = {A study on ultrathin hafnium nitride gate insulator formed by ECR plasma sputtering},
  school = {東京工業大学},
  year = 2013,
}