国際会議発表 (査読有り)

• Katsunobu Nishihara, Kazumi Fujima, Hiroyuki Furukawa, K.Gamada, T.Kagawa, Y-G.Kang, T.Kato, Tohru Kawamura, Fumihiro Koike, R.More, H. Maehara, M.Murakami, Takeshi Nishikawa, A.Sasaki, A.Sunahara, H.Tanuma, V.Zhakhovskii, Shinsuke Fujioka, Hiroaki Nishimura, Yoshinori Shimada, S.Uchida, N.Miyanaga, Y.Izawa. Theoretical Modeling and Optimization of LPP EUV Light Source, 3rd International Extreme UltraViolet Lithography Symposium, Miyazaki, Japan, 1-4 November, 2004., 4th International Extreme UltraViolet Lithography (EUVL) Symposium, San Diego, California, USA, 07-09 November, 2005., Vol. http://www.sematech.org/, Nov. 2005.

[ BibTeX 形式で保存 ]    [ 論文・著書をCSV形式で保存 ]    [ 特許をCSV形式で保存 ]