@article{CTT100615416,
  author = {Rinji Sugino and Takashi Ito},
  title = {The formation, imaging, and application of thin silicon-dioxide membrane},
  journal = {Electrochimica Acta},
  year = 2009,
}

@article{CTT100615363,
  author = {杉野林志 and Unsoon Kim and Kyunghoon Min and Ning Chen and Huaqiang Wu and Chungho Lee and Fred Cheung and Hiroyuki Kinoshita and 上西雅彦 and 加藤寿 and 多田新吾 and 伊藤隆司},
  title = {塩素ガスエッチングを用いた微細MOS Elevated Source/Drain プロセス},
  journal = {電子情報通信学会論文誌C},
  year = 2008,
}

@article{CTT100615263,
  author = {伊藤隆司 and 杉野林志 and 石川健治},
  title = {ライ洗浄技術―半導体製造―},
  journal = {精密工学会誌},
  year = 2004,
}

@article{CTT100625361,
  author = {Takashi Ito and Rinji Sugino},
  title = {Dry Cleaning Technologies Using UV-Excited   Radicals and Cryogenic Aerosols},
  journal = {Solid State Phenomena},
  year = 1999,
}

@article{CTT100625369,
  author = {Rinji Sugino and Yoshiko Okui and Mayumi Shigeno and Satoshi Okuno and Kanetake Takasaki and Takashi Ito},
  title = {Dry Cleaning for Fe Contaminants on Si and SiO2   Surfaces with Silicon Chlorides},
  journal = {J. Electrochem. Soc.},
  year = 1997,
}

@article{CTT100625370,
  author = {Rinji Sugino and Takashi Ito},
  title = {Removal of Fe Contaminants in SiO2 Layers with Successive Processing of Poly-Si Deposition and Cl-Radical Etching},
  journal = {J. Electrochem. Soc.},
  year = 1997,
}

@article{CTT100634584,
  author = {Rinji Sugino and Toshiro Nakanishi and Kanetake Takasaki and Takashi Ito},
  title = {Identification of MOS Gate Dielectric Breakdown Spot Using High Selectivity Cl Radical Etching Technique},
  journal = {Journal of The Electrochemical Society},
  year = 1996,
}

@article{CTT100634534,
  author = {杉野林志 and 奈良安雄 and 渡辺悟 and 伊藤隆司},
  title = {光励起塩素ラジカルを用いたシリコンのエッチングとクリーニング},
  journal = {電気化学および工業物理化学},
  year = 1988,
}

@inproceedings{CTT100615478,
  author = {Takashi Ito and Rinji Sugino},
  title = {Micro- and Nano-Cavity Formation on Silicon by   Using A Very Thin Native-Oxide Membrane},
  booktitle = {The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008)},
  year = 2008,
}

@inproceedings{CTT100615434,
  author = {Rinji Sugino and Takashi Ito},
  title = {A Formation of Si Native Oxide Membrane Using High-Selectivity Etching and Application for Nano-Pipe Array and Micro-Diaphragm on Si Substrate},
  booktitle = {Technical Digest of International Electron Devices Meeting (IEDM2006)},
  year = 2006,
}

@inproceedings{CTT100634736,
  author = {Takashi Ito and Rinji Sugino},
  title = {Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols},
  booktitle = {Proc. Fourth Int. Symp. on Ultra Clean Processing of Silicon Surfaces},
  year = 1998,
}