論文

• Rinji Sugino, Takashi Ito. The formation, imaging, and application of thin silicon-dioxide membrane, Electrochimica Acta, Electrochimica Acta, Vol. 54, pp. 5965-6118, Oct. 2009.
• 杉野林志, Unsoon Kim, Kyunghoon Min, Ning Chen, Huaqiang Wu, Chungho Lee, Fred Cheung, Hiroyuki Kinoshita, 上西雅彦, 加藤寿, 多田新吾, 伊藤隆司. 塩素ガスエッチングを用いた微細MOS Elevated Source/Drain プロセス, 電子情報通信学会論文誌C, (社)電子情報通信学会, Vol. J91-C, No. 7, pp. 363-369, July 2008.
• 伊藤隆司, 杉野林志, 石川健治. ライ洗浄技術―半導体製造―, 精密工学会誌, 社団法人精密工学会, Vol. 70, No. 7, pp. 894-897, July 2004.
• Takashi Ito, Rinji Sugino. Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols, Solid State Phenomena, Vol. 65-66, pp. 219-224, July 1999.
• Rinji Sugino, Yoshiko Okui, Mayumi Shigeno, Satoshi Okuno, Kanetake Takasaki, Takashi Ito. Dry Cleaning for Fe Contaminants on Si and SiO2 Surfaces with Silicon Chlorides, J. Electrochem. Soc., Vol. 114, No. 11, pp. 3984-3988, 1997.
• Rinji Sugino, Takashi Ito. Removal of Fe Contaminants in SiO2 Layers with Successive Processing of Poly-Si Deposition and Cl-Radical Etching, J. Electrochem. Soc., Vol. 114, No. 11, pp. 4059-4061, 1997.
• Rinji Sugino, Toshiro Nakanishi, Kanetake Takasaki, Takashi Ito. Identification of MOS Gate Dielectric Breakdown Spot Using High Selectivity Cl Radical Etching Technique, Journal of The Electrochemical Society, The Electrochemical Society, Vol. 143, No. 8, pp. 2691-2694, Aug. 1996.
• 杉野林志, 奈良安雄, 渡辺悟, 伊藤隆司. 光励起塩素ラジカルを用いたシリコンのエッチングとクリーニング, 電気化学および工業物理化学, 電気化学会, Vol. 56, No. 7, pp. 533-537, July 1988.

国際会議発表 (査読有り)

• Takashi Ito, Rinji Sugino. Micro- and Nano-Cavity Formation on Silicon by Using A Very Thin Native-Oxide Membrane, The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008), The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008), The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008), p. 81, Sept. 2008.
• Rinji Sugino, Takashi Ito. A Formation of Si Native Oxide Membrane Using High-Selectivity Etching and Application for Nano-Pipe Array and Micro-Diaphragm on Si Substrate, Technical Digest of International Electron Devices Meeting (IEDM2006), Technical Digest of International Electron Devices Meeting (IEDM2006), Technical Digest of International Electron Devices Meeting (IEDM2006), Vol. 19.6.1, pp. 529-532, Dec. 2006.
• Takashi Ito, Rinji Sugino. Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols, Proc. Fourth Int. Symp. on Ultra Clean Processing of Silicon Surfaces, Proc. Fourth Int. Symp. on Ultra Clean Processing of Silicon Surfaces, pp. 219-224, 1998.

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