論文

• H.D. Trinh, Yueh-Chin Lin, H.C. Wang, C.H. Chang, Kuniyuki KAKUSHIMA, HIROSHI IWAI, Takamasa Kawanago, Y.G. Lin, C.M. Chen, Y.Y.Wong, G.N. Huang, M. Hudait, E.Y. Chang. Effect of Postdeposition, Annealing Temperatures on Electrical Characteristics of Molecular-Beam-Deposited HfO2 on n-InAs/InGaAs Metal-Oxide-Semiconductor Capacitors, Applied Physics Express, Vol. 5, No. 2, pp. .021104-1-3, Feb. 2012.
• H.D. Trinh, G. Brammertz, E.Y. Chang, C.I. Kuo, C.Y. Lu, Y.C. Lin, H. Q. Nguyen, Y. Y. Wong, B.T. Tran, Kuniyuki KAKUSHIMA, HIROSHI IWAI. Electrical Characterization of Al2O3 /n-InAs Metal-Oxide-Semiconductor Capacitors With Various Surface Treatments, IEEE ELECTRON DEVICE LETTERS, Vol. 32, No. 6, June 2011.

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