@article{CTT100634524,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura},
  title = {A High-Speed Write/Erase EAROM Cell},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 1984,
}

@article{CTT100634525,
  author = {土屋真平 and 伊藤隆司 and 中村哲夫},
  title = {傾斜したバンドギャップを持つ高速EAROMセル},
  journal = {電子通信学会論文誌},
  year = 1984,
}

@article{CTT100634517,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa and Hideki Arakawa},
  title = {A Nitride Barrier Avalanche Injection EAROM},
  journal = {IEEE Journal of Solid-State Circuits},
  year = 1982,
}

@article{CTT100634510,
  author = {Shinpei Hijiya and Takashi Ito and Masaichi Shinoda},
  title = {Dual Dielectric Nonvolatile Memory Cells with Thermally Grown Silicon Nitride Films},
  journal = {Fujitsu Scientific and Technical Journal.},
  year = 1980,
}

@article{CTT100634508,
  author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda},
  title = {Low Voltage Alterable EAROM Cells with Nitride-Barrier Avalanche Injection MIS(NAMIS)},
  journal = {IEEE TRANSACTIONS ON ELECTRON DEVICES},
  year = 1979,
}

@article{CTT100634507,
  author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda and Yukio Fukukawa},
  title = {Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen},
  journal = {Journal of The Electrochemical Society},
  year = 1979,
}

@article{CTT100634505,
  author = {Takashi Ito and Shinpei Hijiya and Hidetoshi Nishi and Masaichi Shinoda and Toshio Furuya},
  title = {Interfacial Doping by Recoil Implantation for Nonvolatile Memories},
  journal = {Japanese Journal of Applied Physics. Supplement},
  year = 1978,
}

@inproceedings{CTT100634672,
  author = {Kunihiro Suzuki and Tetsu Fukano and Tatsuya Yamazaki and Shinpei Hijiya and Takashi Ito and Hajime Ishikawa},
  title = {Pseudo-HBT with Polysilicon Emitter Contact and an Ultra shallow Highly Doped Base by Photoepitaxy},
  booktitle = {Tech. Dig. of, IEDM},
  year = 1998,
}

@inproceedings{CTT100634709,
  author = {Yoshihiro Arimoto and Shinpei Hijiya and Takashi Ito},
  title = {Advanced Bipolar and MOS  Devices Based on Silicon Wafer-Bonding},
  booktitle = {Proc. 1st. Int. Symp. on Semicon. Wafer Bonding, ECS},
  year = 1992,
}

@inproceedings{CTT100634689,
  author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Nobuo Kikuchi and Junichi Teramae and Akinao Ogawa and Shinpei Hijiya and Takashi Ito},
  title = {Photo-Excited Dry Cleaning for ULSI},
  booktitle = {Proc. of VLSI Symp. on Tech. System and Application},
  year = 1991,
}

@inproceedings{CTT100634604,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa and Hideki Arakawa},
  title = {A Nitride Barrier Avalanche Injection EAROM},
  booktitle = {ISSCC Dig. of Tech. Papers},
  year = 1982,
}

@inproceedings{CTT100634600,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura and Nobuo Toyokura and Hajime Ishikawa},
  title = {Electrically Alterable Read Only Memory Cell with Graded Energy Band-Gap Insulator},
  booktitle = {Tech. Dig. of IEDM},
  year = 1980,
}

@inproceedings{CTT100634597,
  author = {Takashi Ito and Shinpei Hijiya and Hajime Ishikawa and Masaichi Shinoda},
  title = {0V Write/Erase EAROM Cells with Directly Nitrided Silicon Nitride Films as First  Insulating Layers},
  booktitle = {Tech. Dig. of IEDM},
  year = 1977,
}

@inproceedings{CTT100634596,
  author = {Takashi Ito and Shinpei Hijiya and Hidetoshi Nishi and Masaichi Shinoda and Toshio Furuya},
  title = {Interfacial Doping by Recoil Implantation for Nonvolatile Memories},
  booktitle = {Ext. Abs. on 9th Conf: on SSDM},
  year = 1977,
}

@inproceedings{CTT100634595,
  author = {Takashi Ito and Takao Nozaki and Hideki Arakawa and Shinpei Hijiya and Masaichi Shinoda and Yukio Fukukawa},
  title = {Thermally Nitrided Silicon Films By Direct Reaction},
  booktitle = {Abs. of 150th ECS Fall Meeting},
  year = 1976,
}