@article{CTT100634533,
  author = {Takashi Kato and Takashi Ito},
  title = {Interfacial Oxidation of Silicon Substrates through Ta2O5},
  journal = {Journal of The Electrochemical Society},
  year = 1988,
}

@article{CTT100634532,
  author = {Takashi Kato and Takashi Ito and Mamoru Maeda},
  title = {Chemical Vapor Deposition of Aluminum Enhanced by Magnetron-Plasma},
  journal = {Journal of The Electrochemical Society},
  year = 1988,
}

@inproceedings{CTT100634658,
  author = {Takashi Kato and Takashi Ito and Hajime Ishikawa},
  title = {In Situ,Carbon-Doped Aluminum Metallization for VLSI/ULSI Interconnection},
  booktitle = {Tech. Dig. of IEDM},
  year = 1988,
}

@inproceedings{CTT100634614,
  author = {Masaru Muto and Takashi Kato and Takashi Ito and Hajime Ishikawa},
  title = {ZrSi2 for LSI Contat System},
  booktitle = {Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli.},
  year = 1985,
}

@inproceedings{CTT100634615,
  author = {Masaru Muto and Takashi Kato and Takashi Ito and Hajime Ishikawa},
  title = {Self-aligned  Silicidation of Zr and Its Comparison with Ti},
  booktitle = {Ext. Abst. of 17th Conf. on SSDM},
  year = 1985,
}

@inproceedings{CTT100634609,
  author = {Takashi Kato and Takashi Ito and Masao Taguchi and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Interfacial Oxidation of Ta205-Si Systems for High Density DRAM},
  booktitle = {Dig. of Tech. Papers on 1983 Symp. on VLSI Tech.},
  year = 1983,
}