@article{CTT100634588, author = {伊藤隆司 and 杉野林志 and 石川健治}, title = {ドライ洗浄技術―半導体製造―}, journal = {精密工学会誌}, year = 2004, } @article{CTT100634577, author = {Rinshi Sugino and Yasuo Nara and Hiroshi Horie and Takashi Ito}, title = {Ultraviolet Excited Cl-Radical Etching of Si Through Native Oxides}, journal = {Journal of Applied Physics}, year = 1994, } @article{CTT100634568, author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Toshiro Nakanishi and Takashi Ito}, title = {Electrical Characteristics of Silicon Devices after UV-Excited Cleaning}, journal = {IEICE Transaction on Electronics}, year = 1993, } @article{CTT100634564, author = {Rinshi Sugino and Yoshiko Okui and Masaki Okuno and Mayumi Shigeno and Yasuhisa Sato and Akira Osawa and Takashi Ito}, title = {Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning}, journal = {IEICE TRANSACTIONS on Electronics}, year = 1992, } @article{CTT100634562, author = {Hiroki Ogawa and Naozumi Terada and Kazuhisa Sugiyama and Kazunori Moriki and Noriyuki Miyata and Takayuki Aoyama and Rinshi Sugino and Takashi Ito and Takeo Hattori}, title = {Silicon-Hydrogen Bonds in Silicon Oxide Near the SiO2/Si Interface}, journal = {Applied Surface Science}, year = 1992, } @article{CTT100634556, author = {Yasuhiro Sato and Rinshi Sugino and Takashi Ito}, title = {Photoexcited Processes for Semiconductor Dry Cleaning and Dry Etching}, journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL}, year = 1991, } @article{CTT100634543, author = {Kazuhisa Sugiyama and Takayuki lgarashi and Kazunori Moriki and Yoshikatsu Nagasawa and Takayuki Aoyama and Rinshi Sugino and Takashi Ito and Takeo Hattori}, title = {Silicon-Hydrogen Bonds in Native Oxides Formed During Wet Chemical Treatments}, journal = {Japanese Journal of Applied Physics}, year = 1990, } @article{CTT100634541, author = {Satoru Watanabe and Rinshi Sugino and Tatsuya Yamazaki and Yasuo Nara and Takashi Ito}, title = {Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy}, journal = {Japanese Journal of Applied Physics}, year = 1989, } @article{CTT100634539, author = {Takeo Hattori and Kazuhiro Takase and Hiroaki Yamagishi and Rinshi Sugino and Yasuo Nara and Takashi Ito}, title = {Chemical Structures of Native Oxides Formed during Wet Chemical Treatment}, journal = {Japanese journal of applied physics}, year = 1989, } @inproceedings{CTT100634731, author = {Rinshi Sugino and Yoshiko Okui and Mayumi Shigeno and Satoshi Ohkubo and Kanetake Takasaki and Takashi Ito}, title = {Dry Cleaning of Si and SiO2 Surfaces Using SiC14 System}, booktitle = {Proc. Int. Symp. on Semicon. Manufacturing}, year = 1995, } @inproceedings{CTT100634732, author = {Rinshi Sugino and Toshiro Nakanishi and Kanetake Takasaki and Takashi Ito}, title = {Identification of MOS Gate Dielectric-Breakdown Spot Using High-Selectivity Etching}, booktitle = {Ext. Abs. of Int. Conf. on SSDM}, year = 1995, } @inproceedings{CTT100634718, author = {Takashi Ito and Rinshi Sugino and Yasuhisa Sato}, title = {Reliable Thin Gate Oxide Film Formed After UV Cleaning}, booktitle = {Proc. 4th Int. Symp. on ULSI Sci. and Tech.}, year = 1993, } @inproceedings{CTT100634710, author = {Takashi Ito and Rinshi Sugino and Yasuhiro Sato and Masaki Okuno and Akira Osawa and Takayuki Aoyama and Tatsuya Yamazaki and Yoshihiro Arimoto}, title = {Photo-Excited Cleaning of Silicon with Chlorine and Fluorine}, booktitle = {MRS Symp. Proceeding}, year = 1992, } @inproceedings{CTT100634689, author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Nobuo Kikuchi and Junichi Teramae and Akinao Ogawa and Shinpei Hijiya and Takashi Ito}, title = {Photo-Excited Dry Cleaning for ULSI}, booktitle = {Proc. of VLSI Symp. on Tech. System and Application}, year = 1991, } @inproceedings{CTT100634704, author = {Rinshi Sugino and Masaki Okuno and Yoshiko Okui and Mayumi Shigeno and Yasuhisa Sato and Akira Osawa and Takashi Ito}, title = {UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum}, booktitle = {Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting}, year = 1991, } @inproceedings{CTT100634683, author = {Kazuhisa Sugiyama and Takayuki lgarashi and Kazunori Moriki and Yoshikatsu Nagasawa and Takayuki Aoyama and Rinshi Sugino and Takashi Ito and Takeo Hattori}, title = {Silicon- Hydrogen Bonds in Native Oxides Formed During Wet Chemical Treatments}, booktitle = {Ext. Abst. of Int. Conf. on SSDM}, year = 1990, } @inproceedings{CTT100634684, author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Takashi Ito}, title = {Reliability Improvement of the MOS Structures Using Photo-Excited Dry Cleaning Before Oxidation}, booktitle = {Ext. Abst. of Int. Conf. on SSDM}, year = 1990, } @inproceedings{CTT100634685, author = {Takashi Ito and Rinshi Sugino and Satoru Watanabe and Yasuo Nara and Yasuhisa Sato}, title = {UV-Enhanced Dry Cleaning of Silicon Wafers}, booktitle = {Proc. Int. Symp. on Cleaning Technology in Semicon. Device}, year = 1990, } @inproceedings{CTT100634681, author = {Takeo Hattori and Kazuki Takase and Hiroshi Yamagishi and Rinshi Sugino and Yasuo Nara and Takashi Ito}, title = {Chemical Structures of Native Oxides Formed During Wet Chemical Treatments}, booktitle = {Abstract of Electronic Mat. Conf.}, year = 1989, } @inproceedings{CTT100634678, author = {Kazuo Takase and Toshio Igarashi and Norio Miyata and Koji Moriki and Rinshi Sugino and Yasuo Nara and Takashi Ito and Minoru Fujisawa and Takeo Hattori}, title = {Native Oxide Formed During Wet Chemical Treatments}, booktitle = {Ext. Abs. of 2lst Conf. on SSDM}, year = 1989, } @inproceedings{CTT100634676, author = {Rinshi Sugino and Ryuji Takizawa and Yasuhisa Sato and Takashi Ito}, title = {Characterization of Si-SiO2 Interfaces Formed After Photo-Excited Cleaning}, booktitle = {Ext. Abs. of 2lst Conf. on SSDM}, year = 1989, } @inproceedings{CTT100634669, author = {Satoru Watanabe and Rinshi Sugino and Tatsuya Yamazaki and Yasuo Nara and Takashi Ito}, title = {Wafer-Cleaning with Photo-Excited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy}, booktitle = {Dig. of 2nd MicroProcess Conf.}, year = 1989, } @inproceedings{CTT100634656, author = {Takashi Ito and Rinshi Sugino and Tatsuya Yamazaki and Satoru Watanabe and Yasuo Nara}, title = {Photochemical Cleaning of Silicon Wafers with Halogen Radicals}, booktitle = {1987 ECS Fall Meeting}, year = 1987, } @inproceedings{CTT100634635, author = {Rinshi Sugino and Yasuo Nara and Tatsuya Yamazaki and Satoru Watanabe and Takashi Ito}, title = {Through-Oxide Cleaning of Silicon Surface by Photo-Excited Radicals}, booktitle = {Ext. Abs. of 19th Conf. on SSDM}, year = 1987, } @inproceedings{CTT100634625, author = {Tatsuya Yamazaki and Rinshi Sugino and Takashi Ito and Hajime Ishikawa}, title = {Photo-Chemical Effects for Low Temperature Si Epitaxy}, booktitle = {Ext. Abst. of 1986 Int. Conf. on SSDM}, year = 1986, }