論文

• 伊藤隆司, 杉野林志, 石川健治. ドライ洗浄技術―半導体製造―, 精密工学会誌, 精密工学会, Vol. 70, No. 7, pp. 894-897, July 2004.
• Rinshi Sugino, Yasuo Nara, Hiroshi Horie, Takashi Ito. Ultraviolet Excited Cl-Radical Etching of Si Through Native Oxides, Journal of Applied Physics, American Institute of Physics, Vol. 76, No. 9, pp. 5498-5502, Feb. 1994.
• Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Toshiro Nakanishi, Takashi Ito. Electrical Characteristics of Silicon Devices after UV-Excited Cleaning, IEICE Transaction on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-76C, No. 1, pp. 41-45, Jan. 1993.
• Rinshi Sugino, Yoshiko Okui, Masaki Okuno, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning, IEICE TRANSACTIONS on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-75-C, No. 7, pp. 829-833, July 1992.
• Hiroki Ogawa, Naozumi Terada, Kazuhisa Sugiyama, Kazunori Moriki, Noriyuki Miyata, Takayuki Aoyama, Rinshi Sugino, Takashi Ito, Takeo Hattori. Silicon-Hydrogen Bonds in Silicon Oxide Near the SiO2/Si Interface, Applied Surface Science, ELSEVIER, Vol. 56-58, pp. 836-840, 1992.
• Yasuhiro Sato, Rinshi Sugino, Takashi Ito. Photoexcited Processes for Semiconductor Dry Cleaning and Dry Etching, FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, Fijitsu, Vol. 27, No. 4, pp. 317-325, Dec. 1991.
• Kazuhisa Sugiyama, Takayuki lgarashi, Kazunori Moriki, Yoshikatsu Nagasawa, Takayuki Aoyama, Rinshi Sugino, Takashi Ito, Takeo Hattori. Silicon-Hydrogen Bonds in Native Oxides Formed During Wet Chemical Treatments, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 29, No. 12, pp. L2401-L2404, Dec. 1990.
• Satoru Watanabe, Rinshi Sugino, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 28, No. 10, pp. 2167-2171, Aug. 1989.
• Takeo Hattori, Kazuhiro Takase, Hiroaki Yamagishi, Rinshi Sugino, Yasuo Nara, Takashi Ito. Chemical Structures of Native Oxides Formed during Wet Chemical Treatment, Japanese journal of applied physics, The Japan Society of Applied Physics, Vol. 28, No. 2, pp. L296-L298, Feb. 1989.

国際会議発表 (査読有り)

• Rinshi Sugino, Yoshiko Okui, Mayumi Shigeno, Satoshi Ohkubo, Kanetake Takasaki, Takashi Ito. Dry Cleaning of Si and SiO2 Surfaces Using SiC14 System, Proc. Int. Symp. on Semicon. Manufacturing, Proc. Int. Symp. on Semicon. Manufacturing, pp. 262-265, 1995.
• Rinshi Sugino, Toshiro Nakanishi, Kanetake Takasaki, Takashi Ito. Identification of MOS Gate Dielectric-Breakdown Spot Using High-Selectivity Etching, Ext. Abs. of Int. Conf. on SSDM, Ext. Abs. of Int. Conf. on SSDM, 1995.
• Takashi Ito, Rinshi Sugino, Yasuhisa Sato. Reliable Thin Gate Oxide Film Formed After UV Cleaning, Proc. 4th Int. Symp. on ULSI Sci. and Tech., Proc. 4th Int. Symp. on ULSI Sci. and Tech., p. 163, 1993.
• Takashi Ito, Rinshi Sugino, Yasuhiro Sato, Masaki Okuno, Akira Osawa, Takayuki Aoyama, Tatsuya Yamazaki, Yoshihiro Arimoto. Photo-Excited Cleaning of Silicon with Chlorine and Fluorine, MRS Symp. Proceeding, MRS Symp. Proceeding, 1992.
• Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Nobuo Kikuchi, Junichi Teramae, Akinao Ogawa, Shinpei Hijiya, Takashi Ito. Photo-Excited Dry Cleaning for ULSI, Proc. of VLSI Symp. on Tech. System and Application, Proc. of VLSI Symp. on Tech. System and Application, 1991.
• Rinshi Sugino, Masaki Okuno, Yoshiko Okui, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, pp. 512-513, 1991.
• Kazuhisa Sugiyama, Takayuki lgarashi, Kazunori Moriki, Yoshikatsu Nagasawa, Takayuki Aoyama, Rinshi Sugino, Takashi Ito, Takeo Hattori. Silicon- Hydrogen Bonds in Native Oxides Formed During Wet Chemical Treatments, Ext. Abst. of Int. Conf. on SSDM, Ext. Abst. of Int. Conf. on SSDM, 1990.
• Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Takashi Ito. Reliability Improvement of the MOS Structures Using Photo-Excited Dry Cleaning Before Oxidation, Ext. Abst. of Int. Conf. on SSDM, Ext. Abst. of Int. Conf. on SSDM, 1990.
• Takashi Ito, Rinshi Sugino, Satoru Watanabe, Yasuo Nara, Yasuhisa Sato. UV-Enhanced Dry Cleaning of Silicon Wafers, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, p. 114, 1990.
• Takeo Hattori, Kazuki Takase, Hiroshi Yamagishi, Rinshi Sugino, Yasuo Nara, Takashi Ito. Chemical Structures of Native Oxides Formed During Wet Chemical Treatments, Abstract of Electronic Mat. Conf., Abstract of Electronic Mat. Conf., 1989.
• Kazuo Takase, Toshio Igarashi, Norio Miyata, Koji Moriki, Rinshi Sugino, Yasuo Nara, Takashi Ito, Minoru Fujisawa, Takeo Hattori. Native Oxide Formed During Wet Chemical Treatments, Ext. Abs. of 2lst Conf. on SSDM, Ext. Abs. of 2lst Conf. on SSDM, pp. 393-394, 1989.
• Rinshi Sugino, Ryuji Takizawa, Yasuhisa Sato, Takashi Ito. Characterization of Si-SiO2 Interfaces Formed After Photo-Excited Cleaning, Ext. Abs. of 2lst Conf. on SSDM, Ext. Abs. of 2lst Conf. on SSDM, pp. 417-418, 1989.
• Satoru Watanabe, Rinshi Sugino, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Wafer-Cleaning with Photo-Excited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy, Dig. of 2nd MicroProcess Conf., Dig. of 2nd MicroProcess Conf., pp. 120-121, 1989.
• Takashi Ito, Rinshi Sugino, Tatsuya Yamazaki, Satoru Watanabe, Yasuo Nara. Photochemical Cleaning of Silicon Wafers with Halogen Radicals, 1987 ECS Fall Meeting, 1987 ECS Fall Meeting, pp. 1076-1077, 1987.
• Rinshi Sugino, Yasuo Nara, Tatsuya Yamazaki, Satoru Watanabe, Takashi Ito. Through-Oxide Cleaning of Silicon Surface by Photo-Excited Radicals, Ext. Abs. of 19th Conf. on SSDM, Ext. Abs. of 19th Conf. on SSDM, pp. 207-208, 1987.
• Tatsuya Yamazaki, Rinshi Sugino, Takashi Ito, Hajime Ishikawa. Photo-Chemical Effects for Low Temperature Si Epitaxy, Ext. Abst. of 1986 Int. Conf. on SSDM, Ext. Abst. of 1986 Int. Conf. on SSDM, pp. 213-214, 1986.

[ BibTeX 形式で保存 ]    [ 論文・著書をCSV形式で保存 ]    [ 特許をCSV形式で保存 ]