論文

• Kenichi Goto, Tatsuya Yamazaki, Yasuo Nara, Tetsu Fukano, Toshihiro Sugii, Yoshihiro Arimoto, Takashi Ito. Ti Salicide Process for Sub-quarter-Micron CMOS Devices, IEICE TRANSACTIONS on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-77-C, No. 3, pp. 480-485, Mar. 1994.
• Rinshi Sugino, Yasuo Nara, Hiroshi Horie, Takashi Ito. Ultraviolet Excited Cl-Radical Etching of Si Through Native Oxides, Journal of Applied Physics, American Institute of Physics, Vol. 76, No. 9, pp. 5498-5502, Feb. 1994.
• Yasuo Nara, Yoshihiro Sugita, Kei Horiuchi, Takashi Ito. Fine Pattern Etching of Silicon Using SR-Assisted lonization of CP4 Gas, Journal of Photopolymer Science and Technology, The Conference of Photopolymer Science and Technology, Vol. 6, No. 4, pp. 617-24, 1993.
• Yasuo Nara, Fabrice Moscheni, Yoshio Sugita, Kei Horiuchi, Takashi Ito. Evaluation of Photoemitted Current from SiO2 Film on Silicon During Synchrotron Radiation lrradiation, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 31, No. 12B, pp. 4454-4458, Dec. 1992.
• Yasuo Nara, Yoshihiro Sugita, Kei Horiuchi, Takashi Ito. Synchrotron Radiation-Assisted Silicon Homoepitaxy at 100 ℃ Using Si2H6/H2 Mixture, Applied Phisics Letters, American Institute of Physics, Vol. 61, No. 1, pp. 93-95, July 1992.
• Yasuo Nara, Yoshihiro Sugita, Kei Horiuchi, Takashi Ito. Synchrotron Radiation-Assisted Silicon Film Growth by lrradiation Parallel to the Substrate, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 31, No. 8, pp. 2333-2337, June 1992.
• Yasuo Nara, Yoshihiro Sugita, Noriaki Nakayama, Takashi Ito. Etching of Si02 Film by Synchrotron Radiation in Hydrogen and its Application to Low Temperature Surface Cleaning, Journal of Vaccum Science and Technology, AVS, Vol. B10, pp. 274-277, Jan. 1992.
• Yasuo Nara, Yoshihiro Sugita, Noriaki Nakayama, Takashi Ito. Synchrotron Radiation Assisted Removal of Oxygen and Carbon Contaminants from a Silicon Surface, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 30, No. 10A, pp. L1753-L1755, Oct. 1991.
• Satoru Watanabe, Rinshi Sugino, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 28, No. 10, pp. 2167-2171, Aug. 1989.
• Takeo Hattori, Kazuhiro Takase, Hiroaki Yamagishi, Rinshi Sugino, Yasuo Nara, Takashi Ito. Chemical Structures of Native Oxides Formed during Wet Chemical Treatment, Japanese journal of applied physics, The Japan Society of Applied Physics, Vol. 28, No. 2, pp. L296-L298, Feb. 1989.
• 杉野林志, 奈良安雄, 渡辺悟, 伊藤隆司. 光励起塩素ラジカルを用いたシリコンのエッチングとクリーニング, 電気化学および工業物理化学, 電気化学会, Vol. 56, No. 7, pp. 533-537, July 1988.

国際会議発表 (査読有り)

• Takashi Ito, Tatsuya Yamazaki, Satoru Watanabe, Yasuo Nara, Hajime Ishikawa. Photoenhancement in Low-Temperature Silicon Epitaxy, Proc. Int. Symp. on Advanced Materials for ULSI, 1988 ECS Spring Meeting, Proc. Int. Symp. on Advanced Materials for ULSI, 1988 ECS Spring Meeting, No. 183, p. 285, 1998.
• Tatsuya Yamazaki, Kenichi Goto, Tetsu Fukano, Yasuo Nara, Toshihiro Sugii, Takashi Ito. 2l psec Switching 0.13μm-CMOS at Room Temperature Using High Performance Co Salicide Process, IEDM Dig. of Tech., IEDM Dig. of Tech., pp. 906-909, 1993.
• Yasuo Nara, Yoshihiro Sugita, Kei Horiuchi, Takashi Ito. SR-Assisted Epitaxy and Surface Cleaning of Silicon, Proc. of A Workshop on Two-dimensional Semiconductor Research using Synchrotron Radiation, Proc. of A Workshop on Two-dimensional Semiconductor Research using Synchrotron Radiation, p. 15, 1993.
• Akira Sato, Youichi Momiyama, Yasuo Nara, Toshihiro Sugii, Yoshihiro Arimoto, Takashi Ito. A 0.5μm EEPROM Cell Using Poly-Si TFT Technology, Proc. 5lth Annual Device Research Conference, Proc. 5lth Annual Device Research Conference, 1993.
• Yasuo Nara, Yoshio Sugita, Kei Horiuchi, Takashi Ito. Evaluation of Photoemitted Current from SiO2 Film on Silicon during Synchrotron Radiation lrradiation, Proc. of Microprocess Conference, Proc. of Microprocess Conference, pp. 184-185, 1992.
• Takashi Ito, Rinshi Sugino, Satoru Watanabe, Yasuo Nara, Yasuhisa Sato. UV-Enhanced Dry Cleaning of Silicon Wafers, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, p. 114, 1990.
• Satoru Watanabe, Rinshi Sugino, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Wafer-Cleaning with Photo-Excited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy, Dig. of 2nd MicroProcess Conf., Dig. of 2nd MicroProcess Conf., pp. 120-121, 1989.
• Kazuo Takase, Toshio Igarashi, Norio Miyata, Koji Moriki, Rinshi Sugino, Yasuo Nara, Takashi Ito, Minoru Fujisawa, Takeo Hattori. Native Oxide Formed During Wet Chemical Treatments, Ext. Abs. of 2lst Conf. on SSDM, Ext. Abs. of 2lst Conf. on SSDM, pp. 393-394, 1989.
• Takeo Hattori, Kazuki Takase, Hiroshi Yamagishi, Rinshi Sugino, Yasuo Nara, Takashi Ito. Chemical Structures of Native Oxides Formed During Wet Chemical Treatments, Abstract of Electronic Mat. Conf., Abstract of Electronic Mat. Conf., 1989.
• Satoru Watanabe, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Photo- Enhanced Boron Doping in Low-Temperature Silicon Epitaxy and its FTIR Study, Ext. Abs. of 20th Conf. on SSDM, Ext. Abs. of 20th Conf. on SSDM, pp. 117-118, 1988.
• Takashi Ito, Rinshi Sugino, Tatsuya Yamazaki, Satoru Watanabe, Yasuo Nara. Photochemical Cleaning of Silicon Wafers with Halogen Radicals, 1987 ECS Fall Meeting, 1987 ECS Fall Meeting, pp. 1076-1077, 1987.
• Rinshi Sugino, Yasuo Nara, Tatsuya Yamazaki, Satoru Watanabe, Takashi Ito. Through-Oxide Cleaning of Silicon Surface by Photo-Excited Radicals, Ext. Abs. of 19th Conf. on SSDM, Ext. Abs. of 19th Conf. on SSDM, pp. 207-208, 1987.

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