論文

• Satoru Watanabe, Kei Horiuchi, Takashi Ito. Atomic Step Structure on Vicinal H/Si (111) Surface Formed by Hot Water Immersion, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 32, No. 8, pp. 3420-3425, Aug. 1993.
• Satoru Watanabe, Mayumi Shigeno, Noriaki Nakayama, Takashi Ito. Silicon Monohydride Termination of Silicon (111) Surface Formed by Boiling Water, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 30, No. 12B, pp. 3575-3579, Dec. 1991.
• Satoru Watanabe, Noriaki Nakayama, Takashi Ito. Homogeneous Hydrogen-Terminated Si(111) Surface Formed Using Aqueous HF Solution and Water, Applied Phisics Letters, American Institute of Physics, Vol. 59, No. 12, pp. 1458-1460, Nov. 1991.
• 渡辺悟, 滋野真弓, 伊藤隆司. プロセスを高性能化する水素ターミネートSi表面, ウルトラクリーンテクノロジー, pp. 3(101)-8(106), Mar. 1991.
• Tatsuya Yamazaki, Satoru Watanabe, Takashi Ito. Heavy Boron Doping in Low Temperature Si Photoepitaxy, Journal of The Electrochemical Society, The Electrochemical Society, Vol. 137, No. 1, pp. 313-318, Jan. 1990.
• Satoru Watanabe, Rinshi Sugino, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 28, No. 10, pp. 2167-2171, Aug. 1989.
• 杉野林志, 奈良安雄, 渡辺悟, 伊藤隆司. 光励起塩素ラジカルを用いたシリコンのエッチングとクリーニング, 電気化学および工業物理化学, 電気化学会, Vol. 56, No. 7, pp. 533-537, July 1988.

国際会議発表 (査読有り)

• Takashi Ito, Tatsuya Yamazaki, Satoru Watanabe, Yasuo Nara, Hajime Ishikawa. Photoenhancement in Low-Temperature Silicon Epitaxy, Proc. Int. Symp. on Advanced Materials for ULSI, 1988 ECS Spring Meeting, Proc. Int. Symp. on Advanced Materials for ULSI, 1988 ECS Spring Meeting, No. 183, p. 285, 1998.
• Yoshihiro Sugita, Naoki Awaji, Satoshi Ohkubo, Satoru Watanabe, Satoshi Komiya, Takashi Ito. X Ray Refractometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment, Ext. Abst. of 1995 Int. Conf. on SSDM, Ext. Abst. of 1995 Int. Conf. on SSDM, pp. 836-837, 1995.
• Satoru Watanabe, Kei Horiuchi, Takashi Ito. Stable Hydride Structure on Si(lll) Surface in Pure Water, Proc. MRS Symp., Proc. MRS Symp., Vol. 315, p. 458, 1993.
• Satoru Watanabe, Noriaki Nakayama, Takashi Ito. Infrared Observation of Hydrogen-Terminated Silicon Surface with VUV Irradiation, Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry, Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry, p. 85, 1991.
• Satoru Watanabe, Mayumi Shigeno, Noriaki Nakayama, Takashi Ito. Silicon Monohydride Termination of Silicon (111) Surface Formed by Boiling Water, Ext. Abst. of 1991 Int. Conf. on SSDM, Ext. Abst. of 1991 Int. Conf. on SSDM, pp. 502-503, 1991.
• Takashi Ito, Rinshi Sugino, Satoru Watanabe, Yasuo Nara, Yasuhisa Sato. UV-Enhanced Dry Cleaning of Silicon Wafers, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, p. 114, 1990.
• Satoru Watanabe, Takashi Ito. Diborane Addition Effect on Second Order Reactions of Si Photo-CVD under Vacuum Ultraviolet lrradiation, Ext. Abst. of Int. Conf. on SSDM, Ext. Abst. of Int. Conf. on SSDM, pp. 345-346, 1990.
• Satoru Watanabe, Rinshi Sugino, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Wafer-Cleaning with Photo-Excited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy, Dig. of 2nd MicroProcess Conf., Dig. of 2nd MicroProcess Conf., pp. 120-121, 1989.
• Satoru Watanabe, Tatsuya Yamazaki, Takashi Ito. Wavelength Dependence Boron Doping in Silicon Photochemical Vapor Deposition, Proc. of SPIE, Proc. of SPIE, Vol. 119, No. 10-1, pp. 104-108, 1989.
• Satoru Watanabe, Tatsuya Yamazaki, Yasuo Nara, Takashi Ito. Photo- Enhanced Boron Doping in Low-Temperature Silicon Epitaxy and its FTIR Study, Ext. Abs. of 20th Conf. on SSDM, Ext. Abs. of 20th Conf. on SSDM, pp. 117-118, 1988.
• Takashi Ito, Rinshi Sugino, Tatsuya Yamazaki, Satoru Watanabe, Yasuo Nara. Photochemical Cleaning of Silicon Wafers with Halogen Radicals, 1987 ECS Fall Meeting, 1987 ECS Fall Meeting, pp. 1076-1077, 1987.
• Rinshi Sugino, Yasuo Nara, Tatsuya Yamazaki, Satoru Watanabe, Takashi Ito. Through-Oxide Cleaning of Silicon Surface by Photo-Excited Radicals, Ext. Abs. of 19th Conf. on SSDM, Ext. Abs. of 19th Conf. on SSDM, pp. 207-208, 1987.
• Tatsuya Yamazaki, Satoru Watanabe, Toshihiro Sugii, Takashi Ito. Ultra Shallow p+ /n Junction Formed by Photo-Enhanced Low-Temperature Epitaxy, Tech. Dig. of IEDM, Tech. Dig. of IEDM, pp. 586-589, 1987.

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