@article{CTT100634564,
  author = {Rinshi Sugino and Yoshiko Okui and Masaki Okuno and Mayumi Shigeno and Yasuhisa Sato and Akira Osawa and Takashi Ito},
  title = {Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1992,
}

@article{CTT100634555,
  author = {渡辺悟 and 滋野真弓 and 伊藤隆司},
  title = {プロセスを高性能化する水素ターミネートSi表面},
  journal = {ウルトラクリーンテクノロジー},
  year = 1991,
}

@inproceedings{CTT100634731,
  author = {Rinshi Sugino and Yoshiko Okui and Mayumi Shigeno and Satoshi  Ohkubo and Kanetake Takasaki and Takashi Ito},
  title = {Dry Cleaning of Si and SiO2 Surfaces Using SiC14 System},
  booktitle = {Proc. Int. Symp. on Semicon. Manufacturing},
  year = 1995,
}

@inproceedings{CTT100634704,
  author = {Rinshi Sugino and Masaki Okuno and Yoshiko Okui and Mayumi Shigeno and Yasuhisa Sato and Akira Osawa and Takashi Ito},
  title = {UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum},
  booktitle = {Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting},
  year = 1991,
}