論文

• Rinshi Sugino, Yoshiko Okui, Masaki Okuno, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning, IEICE TRANSACTIONS on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-75-C, No. 7, pp. 829-833, July 1992.
• 渡辺悟, 滋野真弓, 伊藤隆司. プロセスを高性能化する水素ターミネートSi表面, ウルトラクリーンテクノロジー, pp. 3(101)-8(106), Mar. 1991.

国際会議発表 (査読有り)

• Rinshi Sugino, Yoshiko Okui, Mayumi Shigeno, Satoshi Ohkubo, Kanetake Takasaki, Takashi Ito. Dry Cleaning of Si and SiO2 Surfaces Using SiC14 System, Proc. Int. Symp. on Semicon. Manufacturing, Proc. Int. Symp. on Semicon. Manufacturing, pp. 262-265, 1995.
• Rinshi Sugino, Masaki Okuno, Yoshiko Okui, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, pp. 512-513, 1991.

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