国際会議発表 (査読有り)

• Rinshi Sugino, Yoshiko Okui, Mayumi Shigeno, Satoshi Ohkubo, Kanetake Takasaki, Takashi Ito. Dry Cleaning of Si and SiO2 Surfaces Using SiC14 System, Proc. Int. Symp. on Semicon. Manufacturing, Proc. Int. Symp. on Semicon. Manufacturing, pp. 262-265, 1995.
• Yoshihiro Sugita, Naoki Awaji, Satoshi Ohkubo, Satoru Watanabe, Satoshi Komiya, Takashi Ito. X Ray Refractometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment, Ext. Abst. of 1995 Int. Conf. on SSDM, Ext. Abst. of 1995 Int. Conf. on SSDM, pp. 836-837, 1995.

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