@inproceedings{CTT100634674,
  author = {Kunihiro Suzuki and Tetsu Fukano and Hiroshi Ishiwari and Tatsuya Yamazaki and Masao Taguchi and Takashi Ito and Hajime Ishikawa},
  title = {50nm Ultra Thin Base Silicon Bipolar. Device Fabrication Based on Photo-epitaxial Growth},
  booktitle = {Digest of Symp. on VLSI Technology},
  year = 1989,
}

@inproceedings{CTT100634609,
  author = {Takashi Kato and Takashi Ito and Masao Taguchi and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Interfacial Oxidation of Ta205-Si Systems for High Density DRAM},
  booktitle = {Dig. of Tech. Papers on 1983 Symp. on VLSI Tech.},
  year = 1983,
}

@inproceedings{CTT100634602,
  author = {Masao Taguchi and Takashi Ito and Tetsu Fukano and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Thermal Nitride Capacitors for High Density RAMs},
  booktitle = {Tech. Dig. of IEDM},
  year = 1981,
}