国際会議発表 (査読有り)

• Masaru Muto, Takashi Kato, Takashi Ito, Hajime Ishikawa. ZrSi2 for LSI Contat System, Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli., Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli., pp. 143-144, 1985.
• Masaru Muto, Takashi Kato, Takashi Ito, Hajime Ishikawa. Self-aligned Silicidation of Zr and Its Comparison with Ti, Ext. Abst. of 17th Conf. on SSDM, Ext. Abst. of 17th Conf. on SSDM, 1985.

[ BibTeX 形式で保存 ]    [ 論文・著書をCSV形式で保存 ]    [ 特許をCSV形式で保存 ]