論文

• Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Toshiro Nakanishi, Takashi Ito. Electrical Characteristics of Silicon Devices after UV-Excited Cleaning, IEICE Transaction on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-76C, No. 1, pp. 41-45, Jan. 1993.
• Rinshi Sugino, Yoshiko Okui, Masaki Okuno, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning, IEICE TRANSACTIONS on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-75-C, No. 7, pp. 829-833, July 1992.

国際会議発表 (査読有り)

• Takashi Ito, Rinshi Sugino, Yasuhisa Sato. Reliable Thin Gate Oxide Film Formed After UV Cleaning, Proc. 4th Int. Symp. on ULSI Sci. and Tech., Proc. 4th Int. Symp. on ULSI Sci. and Tech., p. 163, 1993.
• Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Nobuo Kikuchi, Junichi Teramae, Akinao Ogawa, Shinpei Hijiya, Takashi Ito. Photo-Excited Dry Cleaning for ULSI, Proc. of VLSI Symp. on Tech. System and Application, Proc. of VLSI Symp. on Tech. System and Application, 1991.
• Rinshi Sugino, Masaki Okuno, Yoshiko Okui, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, pp. 512-513, 1991.
• Yasuhisa Sato, Rinshi Sugino, Masaki Okuno, Takashi Ito. Reliability Improvement of the MOS Structures Using Photo-Excited Dry Cleaning Before Oxidation, Ext. Abst. of Int. Conf. on SSDM, Ext. Abst. of Int. Conf. on SSDM, 1990.
• Takashi Ito, Rinshi Sugino, Satoru Watanabe, Yasuo Nara, Yasuhisa Sato. UV-Enhanced Dry Cleaning of Silicon Wafers, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, Proc. Int. Symp. on Cleaning Technology in Semicon. Device, p. 114, 1990.
• Rinshi Sugino, Ryuji Takizawa, Yasuhisa Sato, Takashi Ito. Characterization of Si-SiO2 Interfaces Formed After Photo-Excited Cleaning, Ext. Abs. of 2lst Conf. on SSDM, Ext. Abs. of 2lst Conf. on SSDM, pp. 417-418, 1989.

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