論文

• Fumitoshi Sugimoto, Hiroshi Horie, Yoshihiro Arimoto, Takashi Ito. A pH-Controlled Chemical Mechanical Polishing Method for Thin Bonded Silicon-on-Insulator Wafers, Japanese Journal of Applied Physics, The Japan Society of Applied Phisics, Vol. 34, No. 1, pp. 30-35, Jan. 1995.
• Kunihiro Suzuki, Tetsu Tanaka, Yoshiharu Tosaka, Hiroshi Horie, Yoshihiro Arimoto, Takashi Ito. Analytical Surface Potential Expression for Thin Film Double-Gate SOI MOSFETs, Solid-State Electron, ELSEVIER, Vol. 37, No. 2, pp. 327-332, Feb. 1994.
• Rinshi Sugino, Yasuo Nara, Hiroshi Horie, Takashi Ito. Ultraviolet Excited Cl-Radical Etching of Si Through Native Oxides, Journal of Applied Physics, American Institute of Physics, Vol. 76, No. 9, pp. 5498-5502, Feb. 1994.
• Yoshihiro Arimoto, Hiroshi Horie, Naoshi Higaki, Manabu Kojima, Fumitoshi Sugimoto, Takashi Ito. Advanced Metal Oxide Semiconductor and Bipolar Devices on Bonded Silicon-on-Insulators, Journal of The Electrochemical Society, The Electrochemical Society, Vol. 140, No. 4, pp. 1138-1143, Apr. 1993.
• Takashi Ito, Hiroshi Horie, Tetsu Fukano, Hajime Ishikawa. A Nitride-Isolated Molybdenum-Polysilicon Gate Electrode for MOS VLSI Circuits, IEE Trans Electron Devices, IEEE Electron Devices Society, Vol. ED-33, No. 4, pp. 464-468, Apr. 1986.

国際会議発表 (査読有り)

• Kunihiro Suzuki, Tetsu Tanaka, Hiroshi Horie, Yoshihiro Arimoto, Takashi Ito. Analytical Surface Potential Expression for Double-Gate SOI MOS FETS, Proc. Int. Workshop on VLSI Process and Device Modeling, Proc. Int. Workshop on VLSI Process and Device Modeling, pp. 150-151, 1993.
• Fumio Sugimoto, Hiroshi Horie, Yoshihiro Arimoto, Takashi Ito. A pH- Controlled Chemical Mechanical Polishing Method for Ultra-Thin Bonded SOI Wafer, Dig. of Tech. Papers, Symp. on VLSI Tech., Dig. of Tech. Papers, Symp. on VLSI Tech., pp. 113-114, 1993.
• Takashi Ito, Hiroshi Horie, Tetsu Fukano, Hajime Ishikawa. A Nitride Isolated Molybdenum-Polysilicon Gate Electrode, Dig. of Tech. Papers on 1985 Symp. on VLSI Tech., Dig. of Tech. Papers on 1985 Symp. on VLSI Tech., pp. 60-61, 1985.
• Hiroshi Horie, Tetsu Fukano, Takashi Ito, Hajime Ishikawa. Multiple Self-Alignment MOS Technology (MUSA/MOS), Tech. Dig. of IEDM, Tech. Dig. of IEDM, pp. 398-401, 1984.

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