@article{CTT100911361,
  author = {Takanori Mimura and Reijiro Shimura and Akinori Tateyama and Yoshiko Nakamura and Takahisa Shiraishi and Hiroshi Funakubo},
  title = {No-Heating deposition of ferroelectric x%Y-doped (100–x%)(Hf1−yZry)O2 films},
  journal = {Phys. Status Solidi A},
  year = 2023,
}

@article{CTT100890872,
  author = {Takanori Mimura and Yuki Tashiro and Takao Shimizu and Hiroshi Funakubo},
  title = {Systematic Investigation of Ferroelectric Properties in x%YO1.5-(100-x%)Hf1-yZryO2 Films},
  journal = {ACS Appl. Electron. Mater.},
  year = 2023,
}

@article{CTT100890758,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Preparation of orthorhombic Y-doped TaON film},
  journal = {J Ceram Soc. Jpn.},
  year = 2022,
}

@article{CTT100890812,
  author = {Yongtao Liu and Kyle P. Kelley and Rama K. Vasudevan and Hiroshi Funakubo and Shelby S. Fields and Takanori Mimura and Susan Trolier-McKinstry and Jon F. Ihlefeld and Maxim Ziatdinov and Sergei V. Kalinin},
  title = {Machine Learning-Driven Automated Scanning Probe Microscopy for Ferroelectrics},
  journal = {Microsc. Microanal.},
  year = 2022,
}

@article{CTT100890804,
  author = {Yoshiomi Hiranaga and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Nanoscale Mapping Concerning Asymmetry of Local C-V Curves in Ferroelectric Materials},
  journal = {Jpn. J. Appl. Phy.},
  year = 2022,
}

@article{CTT100874609,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Takahisa Shiraishi and Takao Shimizu and Tomoaki Yamada and Yoshitomo Tanaka and Yukari Inoue and Hiroshi Funakubo},
  title = {No-Heating Deposition of 1-μm-Thick Y-Doped HfO2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method},
  journal = {Phys. Status Solidi RRL},
  year = 2022,
}

@article{CTT100874621,
  author = {Tomoya Sato and Masanori Kodera and Daichi Ichinose and Takanori Mimura and Takao Shimizu and Tomoaki Yamada and Hiroshi Funakubo},
  title = {Domain structures induced by tensile thermal strain in epitaxial PbTiO3 films on silicon substrates},
  journal = {J. Appl. Phys.},
  year = 2022,
}

@article{CTT100864919,
  author = {Pratyush Buragohain and Adam Erickson and Takanori Mimura and Hiroshi Funakubo and Alexei Gruverman},
  title = {Effect of film microstructure on the polarization switching behavior in ferroelectric Y:HfO2 thin films},
  journal = {Adv Functional Material},
  year = 2021,
}

@article{CTT100864855,
  author = {Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness dependence of phase stability in epitaxial (HfxZr1-x)O2 films},
  journal = {Physical review materials},
  year = 2021,
}

@article{CTT100864744,
  author = {Hiranaga Yoshiomi and Mimura Takanori and Shimizu Takao and Funakubo Hiroshi and Cho Yasuo},
  title = {High-precision Local C-V Mapping for Ferroelectrics Using Principal Component Analysis},
  journal = {Jpn. J. Appl. Phys.},
  year = 2021,
}

@article{CTT100863342,
  author = {Yuki Tashiro and Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Comprehensive study on the kinetic formation of the orthorhombic ferroelectric phase in epitaxial Y-doped ferroelectric HfO2 thin films},
  journal = {ACS Applied Electronic Materials 2021},
  year = 2021,
}

@article{CTT100863341,
  author = {Yuki Tashiro and Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Comprehensive study on the kinetic formation of the orthorhombic ferroelectric phase in epitaxial Y-doped ferroelectric HfO2 thin films},
  journal = {ACS Applied Electronic Materials 2021},
  year = 2021,
}

@article{CTT100852792,
  author = {Takanori Mimura and Takao Shimizu and Osami Sakata and Hiroshi Funakubo},
  title = {Large Thermal hysteresis of ferroelectric transition in HfO2-based ferroelectric films},
  journal = {Appl. Phys. Let.},
  year = 2021,
}

@article{CTT100852331,
  author = {Reijiro Shimura and Takanori Mimura and Akinori Tateyama and Takao Shimizu and Tomoaki Yamada and Hiroshi Funakubo},
  title = {Preparation of 1 μm-thick Y-doped HfO2 ferroelectric films on (111)Pt/TiOx/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties},
  journal = {Jpn. J. Appl. Phys.},
  year = 2021,
}

@article{CTT100852833,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko J. Konnno and Osami Sakata and Hiroshi Funakubo},
  title = {Electric-field-induced ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2: Transformation from the paraelectric tetragonal phase to the ferroelectric orthorhombic phase},
  journal = {Physica Status Solidi},
  year = 2021,
}

@article{CTT100849036,
  author = {Yoshiomi Hiranaga and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Local C-V mapping for ferroelectrics using scanning nonlinear dielectric microscopy},
  journal = {J. Appl. Phys.},
  year = 2020,
}

@article{CTT100849008,
  author = {Reijiro Shimura and Takanori Mimura and Takao Shimizu and Yoshitomo Tanaka and Yukari Inoue and Hiroshi Funakubo},
  title = {Preparation of near-1-μm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by an RF magnetron sputtering method},
  journal = {J.Ceram. Soc. Jpn},
  year = 2020,
}

@article{CTT100821137,
  author = {Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films},
  journal = {Jpn. J. Appl. Phys.},
  year = 2020,
}

@article{CTT100821136,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Uchida and Hiroshi Funakubo},
  title = {Room-temperature deposition of ferroelectric HfO2-based films by the sputtering metho},
  journal = {Appl. Phys. Lett.},
  year = 2020,
}

@article{CTT100821123,
  author = {Tomoya Sato and Takanor Kiguchi and Toyohiko Konno and Junichi Kimura and Daichi Ichinose and Takanori Mimura and Hiroshi Funakubo and Kiyoshi Uchiyama},
  title = {Growth of (110)-one-axis-oriented perovskite-type oxide thin films with local epitaxy on (111)SrTiO3 single crystal substrates},
  journal = {Jpn. J. Appl. Phys.},
  year = 2019,
}

@article{CTT100803550,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Ferroelectricity in YO1.5-HfO2 films around 1 μm in thickness},
  journal = {Appl. Phys. Lett.},
  year = 2019,
}

@article{CTT100803191,
  author = {Takanori Mimura and Takao Shimizu and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Effects of heat treatment and in-situ high temperature XRD study on the formation of ferroelectric epitaxial Y doped HfO2 film.},
  journal = {Jpn. J. Appl. Phys.},
  year = 2019,
}

@article{CTT100803179,
  author = {Takao Shimizu and Takanori Mimura and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko Konno and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Ferroelectricity mediated by ferroelastic domain switching in HfO2-based epitaxial thin films},
  journal = {Appl. Phys. Lett.},
  year = 2018,
}

@article{CTT100803130,
  author = {Taisei Suzuki and Takao Shimizu and Takanori Mimura and Hiroshi Uchida and Hiroshi Funakubo},
  title = {Epitaxial ferroelectric Y-doped HfO2 film grown by the RF magnetron sputtering},
  journal = {Jpn. J. Appl. Phys.},
  year = 2018,
}

@article{CTT100800467,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Uchida and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness-dependent crystal structure and electric properties of epitaxial ferroelectric Y2O3-HfO2 films},
  journal = {Appl. Phys. Lett.},
  year = 2018,
}

@article{CTT100800462,
  author = {Tomoya Sato and Daichi Ichinose and Naoya Oshima and Takanori Mimura and Yuichi Nemoto and Takao Shimizu and Yasuhiko Imai and Hiroshi Uchida and Osami Sakata and Hiroshi Funakubo},
  title = {Time response demonstration of in-situ lattice deformation under an applied electric field using synchrotron-based time-resolved XRD in polar-axis-oriented epitaxial Pb(Zr,Ti)O3 film},
  journal = {Jpn. J. Appl. Phys.},
  year = 2018,
}

@article{CTT100769702,
  author = {Yoshiomi Hiranaga and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Dynamic observation of ferroelectric domain switching using scanning nonlinear dielectric microscopy},
  journal = {Jpn. J. Appl. Phys.},
  year = 2017,
}

@article{CTT100744252,
  author = {Tomoya Sato and Daichi Ichinose and Junichi Kimura and Takaaki Inoue and Takanori Mimura and Hiroshi Funakubo and Kiyoshi Uchiyama},
  title = {Fabrication of (110)-one-axis-oriented perovskite-type oxide thin films and their application to buffer layer},
  journal = {Jpn. J. Appl. Phys.},
  year = 2016,
}

@article{CTT100744142,
  author = {Takanori Mimura and Kiliha Katayama and Takao Shimizu and Hiroshi Uchida and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Formation of (111) orientation-controlled ferroelectric orthorhombic HfO2 thin films from solid phase via annealing},
  journal = {Appl. Phys. Lett.},
  year = 2016,
}

@inproceedings{CTT100920015,
  author = {野口雄貴 and 三村和仙 and 清水荘雄 and 舟窪浩 and 平永良臣},
  title = {局所C-Vマッピングと圧電応答顕微鏡の統合計測システムの開発},
  booktitle = {},
  year = 2024,
}

@inproceedings{CTT100920069,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-Vマップの画像処理に基づくナノスケール強誘電分極反転ダイナミクスの解析},
  booktitle = {},
  year = 2024,
}

@inproceedings{CTT100917796,
  author = {前川芳輝 and 三村和仙 and 稲熊宜之 and 岡本一輝 and 舟窪浩},
  title = {Ta添加HfO2薄膜の合成と強誘電性評価},
  booktitle = {},
  year = 2024,
}

@inproceedings{CTT100916745,
  author = {Hiroshi Funakubo and Takao Shimizu and Takanori Mimura and Kazuki Okamoto},
  title = {Ferroelectric and Piezoelectric Properties of Non-perovskite Simple Oxide},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100914312,
  author = {Hiroshi Funakubo and Yuma Takahashi and Takahisa Shiraishi and Kodera Masanori and Reijiro Shimura and Takanori Mimura and Keisuke Ishihama and Kazuki Okamoto and Hiroki Moriwake and Ayako Taguchi and Takao Shimizu and Yasuhiro Fujii and Akitoshi Koreeda},
  title = {Stabilization and Identification of Ferroelectric HfO2 Thin Films},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100914310,
  author = {H. Funakubo and T. Shimizu and T. Mimura and T. Shiraishi and K. Okamoto},
  title = {Impact of electric field on crystal structure and properties of HfO2-based ferroelectric films},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100912049,
  author = {Yoshiomi Hiranaga and Yuki Noguchi and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Research on Correlation Between Grain Boundaries and Ferroelectric Switching Behaviors Through Statistical Analysis of Local C-V Map Datasets},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100912039,
  author = {平永良臣 and 野口雄貴 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-V マッピング法を用いたグレイン境界と強誘電分極反転挙動の関係に関する解析},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100904761,
  author = {平永良臣 and 野口雄貴 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-Vマップの機械学習解析に基づくグレイン境界と強誘電ドメイン挙動の相関に関する統計的評価},
  booktitle = {},
  year = 2023,
}

@inproceedings{CTT100903079,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Hiroshi Funakubo},
  title = {Kinetic formation and field induced phase transition in ferroelectric HfO2- based materials},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100902979,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-Vマッピング法による強誘電体薄膜のナノスケール分極反転ダイナミクスのクラスタ解析},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100902623,
  author = {Pratyush Buragohain and Sangita Dutta and Haidong Lu and Sebastjan Glinšek and Hugo Aramberri and Claudia Richter and Terrence Mittmann and Pamenas Kariuki and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Uwe Schroeder and Emmanuel Defay},
  title = {Observation of Negative Piezoelectricity in HfO2-Based Thin Film Capacitors},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100902622,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-V 曲線の非対称性に関するナノスケールマッピング},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100902547,
  author = {Pratyush P. Buragohain and Sangita Dutta and Haidong Lu and Sebastjan Glinsek and Hugo Aramberri and Claudia Richter and Pamenas Kariuki and Terence Mittmann and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Uwe Schroeder and Emmanuel Defay and Jorge Iniguez and Alexei Gruverman},
  title = {Observation of Negative Piezoelectricity in HfO2-Based Thin-Film Capacitors},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100902548,
  author = {Pratyush P. Buragohain and Adam Erickson and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Alexei Gruverman},
  title = {Intrinsic Switching in Ferroelectric Y:HfO2 Thin Film Capacitors},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100874834,
  author = {三村和仙 and 清水荘雄 and 坂田修身 and 舟窪浩},
  title = {HfO2基強誘電体の相転移における熱履歴},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100874651,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Hiroshi Funakubo},
  title = {Ferroelectricity induced by the kinetic formation in Y-HfO2 epitaxial films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100874691,
  author = {Hiranaga Y. and Mimura T. and Shimizu T. and Funakubo H. and Cho Y.},
  title = {Nanoscale Domain Dynamics Characterization Using Local C-V Mapping},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867226,
  author = {清水荘雄 and 田代裕貴 and 三村和仙 and 舟窪浩},
  title = {Y-置換HfO2基材料の強誘電性の発現},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865369,
  author = {Funakubo, H. and Shimura, R. and Mimura, T. and Tateyama, A. and Nakamura, Y. and Shimizu, T. and Yamada, T. and Tanaka, Y. and Inoue, Y.},
  title = {Low temperature preparation of thick Y-HfO2 ferroelectric films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867241,
  author = {Shimizu, T. and Tashiro Y. and Takanori M. and Shiraishi T. and Kiguchi T. and Konno T. J. and Sakata O. and Funakubo H.},
  title = {Field-Induced Structural Change in HfO2-Based Ferroelectric Materials},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867239,
  author = {高橋雄真 and 白石貴久 and 小寺正徳 and 志村礼司郎 and 三村和仙 and 森分博紀 and 田口綾子 and 舟窪浩},
  title = {HfO2基強誘電体膜のラマン分光測定},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867233,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-Vマッピングにおける主成分分析によるノイズ除去},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865040,
  author = {Hiroshi Funakubo and Yuki Tashiro and Takanori Mimura and Takao Shimizu},
  title = {Phase stability of ferroelectric HfO2-based films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865673,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {局所C-V曲線で観るナノスケール強誘電分極反転挙動},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865385,
  author = {Takao Shimizu and Takanori Mimura and Yuki Tashiro and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Field-induced structural change in HfO2-based ferroelectric materials},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865388,
  author = {Yoshiomi Hiranaga and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Yasuo Cho},
  title = {Local C-V Characterization for Ferroelectric Films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865540,
  author = {Shimizu, T. and Mimura, T. and Tashiro, Y. and Sakata, O. and Funakubo, H},
  title = {Phase transition in HfO2 ferroelectric materials investigated by XRD study},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865036,
  author = {Hiroshi Funakubo and Takanori Mimura and Reijiro Shimura and Yoshiko Nakamura and Takao Shimizu},
  title = {Stability and Room Temperature Deposition of Ferroelectric Phase in Y-Doped (Hf, Zr)O2 Films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865379,
  author = {Takao Shimizu and Takanori Mimura and Yuki Tashiro and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko J. Konno and Osami Sakata and Yoshio Katsuya and Hiroshi Funakubo},
  title = {Structure Change in the HfO2 Ferroelectric Materials Induced by an Electric Field},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853366,
  author = {志村礼司郎 and 三村和仙 and 舘山明紀 and 清水荘雄 and 白石貴久 and 舟窪浩},
  title = {スパッタリング法によるY-HZO強誘電体厚膜の室温製膜とその電気特性および圧電特性評価},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853331,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {強誘電体膜における分極反転挙動のナノスケールマッピング},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853324,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Thickness and composition dependences of epitaxial ferroelectric HfO2 based films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853321,
  author = {清水荘雄 and 江原祥隆 and 三村和仙 and 安井伸太郎 and 山田智明 and 今井康彦 and 坂田修身 and 舟窪浩},
  title = {時間分解XRD測定による周期電界下における菱面体PZTの(111)/(-111)ドメイン構造の観察},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100853267,
  author = {清水荘雄 and 田代裕貴 and 三村和仙 and 舟窪浩},
  title = {HfO2基材料における強誘電相生成機構},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100853255,
  author = {志村礼司郎 and 三村和仙 and 舘山明紀 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法によるHfO2基強誘電体厚膜のシリコン基板上への室温製膜とその電気特性および圧電特性評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100852845,
  author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu},
  title = {High stability of Ferroelectric phase in Y-doped HfO2 films},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100852900,
  author = {J. Molina and T. Mimura and Y. Nakamura and T. Shimizu and H. Funakubo and I. Fujiwara and T. Hoshii and S. Ohmi and A. Hori and H. Wakabayashi and K. Tsutsui and K. Kakushima},
  title = {Interface engineering of BEOL compatible ferroelectric Y:HfO2 device for enhanced endurance},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821832,
  author = {志村礼司郎 and 三村和仙 and 舘山明紀 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法によるHfO2基強誘電体厚膜の室温製膜とその電気特性評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821828,
  author = {三村和仙 and 清水荘雄 and 舟窪浩},
  title = {エピタキシャルHfO2基膜を用いた直方晶相安定化の調査},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821814,
  author = {清水荘雄 and 三村和仙 and 舟窪浩},
  title = {HfO2基強誘電体の相安定性と厚膜化},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821813,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 勝矢良雄 and 坂田修身 and 木口賢紀 and 白石貴久 and 今野豊彦 and 舟窪浩},
  title = {HfO2基薄膜のZr, Yドープによる結晶相変化と強誘電相の安定性},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821258,
  author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu},
  title = {Phase stability and property control of ferroelectric HfO2 films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821774,
  author = {Takao Shimizu and Yoshitaka Ehara and Takanori Mimura and Shintaro Yasui and Tomoaki Yamada and Yasuhiko Imai and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {The Domain Switching in Rhombohedral PZT Observed by In Situ X-Ray Diffraction Study by Various Frequencies},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821753,
  author = {Yu-ki Tashiro and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Preparation and Characterization of Y, Zr-doped HfO2 Thin Film by PLD Method},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821765,
  author = {志村礼司郎 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法を用いたY:HfO2強誘電体厚膜の作製とその電気特性評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821755,
  author = {Takanori Mimura and Takao Shimizu and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Stability of Ferroelectric Orthorhombic Phase in Epitaxial HfO2-based Films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821754,
  author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Recent Progress on Ferroelectric HfO2 Epitaxial Films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821749,
  author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {The phase stability and epitaxial growth of HfO2-based ferroelectric materials},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821741,
  author = {Takanori Kiguchi and Takahisa Shiraishi and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Toyohiko J. Konno},
  title = {Nanodomain Structure of Ferroelectric HfO2-Based Epitaxial Thin Films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821719,
  author = {三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法を用いたY: HfO2強誘電体膜の室温成膜},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821728,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 勝矢良雄 and 坂田修身 and 木口賢紀 and 白石貴久 and 今野豊彦 and 舟窪浩},
  title = {HfO2基薄膜の電界誘起相転移},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821711,
  author = {T. Mimura and T. Shimizu and Y. Katsuya and O. Sakata and H. Funakubo},
  title = {Thickness- and orientationdependence of Curie temperature of ferroelectric epitaxial HfO2 based films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821731,
  author = {Yu-ki Tashiro and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Preparation and characterization of Y, Zr-doped HfO2 thin films by PLD method},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821732,
  author = {Takao Shimizu and Takanori Mimura and HIROSHI FUNAKUBO},
  title = {Preparation of ferroelecttic HfO2 film with a nm-order thickness},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821257,
  author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu},
  title = {Fundamental Characteristics of Ferroelectric HfO2 Using Epitaxial Films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821700,
  author = {Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Thickness-dependent crystal structure of epitaxial ferroelectric 0.07YO1.5-0.93HfO2 and HZO films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821706,
  author = {Takanori Kiguchi and Takahisa Shiraishi and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo and Toyohiko J. Konno},
  title = {Nanostructure Analyses of Hafnia-Based Ferroelectric Thin Films by Aberration-Corrected Electron Microscopy},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821699,
  author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Ferroelectricity in thick HfO2-based films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821305,
  author = {Takao Shimizu and Takanori Mimura and Hiroshi funakubo},
  title = {Robust ferroelectricity in thick HfO2-based film},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821430,
  author = {Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Robust Ferroelectricity in Y-Doped HfO2 Films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821300,
  author = {木口賢紀 and 白石貴久 and 三村和仙 and 清水荘雄 and 舟窪浩 and 今野豊彦},
  title = {STEM-EELS法によるHfO2薄膜の結晶相・配向性の評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821194,
  author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu},
  title = {Property Control of Ferroelectric HfO2 Films},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806489,
  author = {木口賢紀 and 白石貴久 and 三村和仙 and 清水荘雄 and 舟窪浩 and 今野豊彦},
  title = {直方晶相ハフニア薄膜におけるドメイン構造},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806476,
  author = {志村礼司郎 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法により配向制御したHfO2基強誘電体厚膜の作製およびその電気特性評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806479,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {PLD法を用いたY, ZrドープHfO2薄膜の作製と評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806461,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {PLD法を用いたY, ZrドープHfO2薄膜の作製と評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806448,
  author = {清水荘雄 and 三村和仙 and 舟窪浩},
  title = {HfO2基薄膜の相安定性と機能発現},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100804231,
  author = {清水荘雄 and 三村和仙 and 舟窪浩},
  title = {HfO2基強誘電体厚膜の作製と電気特性制御},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100803839,
  author = {Hiroshi Funakubo and Takao Shimizu and Takanori Mimura},
  title = {Phase Stability of HfO2-based Ferroelectric Materials and Their Property Control},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804223,
  author = {木口賢紀 and 白石貴久 and 三村和仙 and 清水荘雄 and 舟窪浩 and 今野豊彦},
  title = {S T E M - E E L S 法による直方晶相ハフニア薄膜の結晶構造評価},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804201,
  author = {志村礼司郎 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {スパッタリング法によるHfO2基強誘電体の厚膜化とその電気特性評価},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804192,
  author = {清水荘雄 and 江原祥隆 and 三村和仙 and 安井伸太郎 and 山田智明 and 今井康彦 and 勝矢良雄 and 坂田修身 and 舟窪浩},
  title = {時間分解放射光X線回折を用いた菱面体晶 PZTにおける非180˚ドメインスイッチングの周波数応答 特性の評価},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804184,
  author = {Taisei Suzkuki and Takanori Mimura and Takao Shimizu and Hiroshi Uchida and Hiroshi Funakubo},
  title = {Growth of epitaxial Y2O3-doped ferroelectric HfO2 films by sputtering method and their characterization},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804159,
  author = {Takanori Mimura and Takao Shimizu and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Yoshio Katsuya and Osami Sakata and Hiroshi Funakubo},
  title = {Effects of heat treatment and in situ high temperature XRD study on the formation of ferroelectric epitaxial HfO2 based film},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804155,
  author = {木口賢紀 and 崔瓍珍 and 白石貴久 and 三村和仙 and 清水荘雄 and 舟窪浩 and 今野豊彦},
  title = {直方晶相ハフニア薄膜のドメイン構造の電子エネルギー損失分光},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804027,
  author = {舟窪浩 and 清水荘雄 and 三村和仙},
  title = {HfO2基強誘電体の相安定性と特性制御},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804080,
  author = {T. Mimura and T. Shimizu and T. Kiguchi and A. Akama and T. J. Konno and Y. Katsuya and O. Sakata and H. Funakubo},
  title = {Temperature Stability of Ferroelectric Phase of Epitaxial Y-doped HfO2 Films},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804091,
  author = {T. Shimizu and T. Mimura and T. Kiguchi and A. Akama and T. J. Konno and Y. Katsuya and O. Sakata and H. Funakubo},
  title = {Domain Structure and Electric Field Induced Domain Switching in HfO2 Ferroelectrics},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100804094,
  author = {T. Kiguchi and T. Shiraishi and T. Shimizu and T. Mimura and H. Funakubo and T. J. Konn},
  title = {Electron Microscopic Study on Domain Structure in HfO2},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100771879,
  author = {三村和仙 and 清水荘雄 and 勝矢良雄 and 坂田修身 and 舟窪浩},
  title = {エピタキシャルHfO2基強誘電体における強誘電特性の膜厚依存性},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100771884,
  author = {伊藤翔陽 and 難波諒太郎 and 三村和仙 and 金子智 and 舟窪浩 and 松田晃史 and 吉本護},
  title = {一軸加圧下熱処理によるBi<sub>2</sub>VO<sub>5+δ</sub>薄膜の配向性固相結晶化と特性評価},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100771874,
  author = {三村和仙 and 清水荘雄 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 勝矢良雄 and 坂田修身 and 舟窪浩},
  title = {エピタキシャル成長したHfO2 基強誘電体膜における結晶構造の膜厚依存性},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100771866,
  author = {T. Shimizu and T. Mimura and T. Kiguchi and T. Shiraishi and A. Akama and T. J. Konno and O. Sakata and K. Yoshio and H. Funakubo},
  title = {Domain switching in epitaxial ferroelectric HfO2 films},
  booktitle = {},
  year = 2018,
}

@inproceedings{CTT100771792,
  author = {清水荘雄 and 三村和仙 and 木口賢紀 and 白石貴久 and 赤間章裕 and 今野豊彦 and 坂田修身 and 勝矢良雄 and 舟窪浩},
  title = {HfO2基強誘電体のドメイン構造と電場誘起スイッチング},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771785,
  author = {清水荘雄 and 三村和仙 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪浩},
  title = {HfO2基材料における強誘電相発現要因の検討},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771782,
  author = {山田智明 and 松尾翔吾 and 加茂崇史 and 三村和仙 and 清水荘雄 and 舟窪浩 and 吉野正人 and 長崎正雅},
  title = {ペロブスカイト型および蛍石型強誘電体薄膜の電気熱量効果},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771708,
  author = {三村和仙 and 清水荘雄 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 勝矢良雄 and 坂田修身 and 舟窪浩},
  title = {Y2O3-HfO2強誘電体の温度安定性},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771707,
  author = {鈴木大生 and 三村和仙 and 清水荘雄 and 内田寛 and 舟窪浩},
  title = {スパッタリング法による{100}配向Y2O3-HfO2強誘電体エピタキシャル薄膜の作製とその評価},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771706,
  author = {佐藤智也 and 一ノ瀬大地 and 三村和仙 and 清水荘雄 and 山田智明 and 舟窪浩},
  title = {エピタキシャルPZT膜におけるマルチドメイン構造と面内歪の緩和},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771701,
  author = {松尾翔吾 and 山田智明 and 三村和仙 and 清水荘雄 and 舟窪浩 and 吉野正人 and 長崎正雅},
  title = {Y添加HfO2エピタキシャル薄膜における負の電気熱量効果},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771697,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {強誘電性HfO2薄膜におけるナノスケール分極反転ドット書き込み},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771495,
  author = {舟窪浩 and 清水荘雄 and 三村和仙},
  title = {HfO2基強誘電体の相安定性とその特性制御},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771559,
  author = {Takanori Mimura and Kiriha Katayama and Takao Shimizu and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Thickness-dependent phase stability of epitaxial ferroelectric HfO2-based films},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771562,
  author = {Tomoya Sato and Daichi Ichinose and Naoya Oshima and Takanori Mimura and Yuichi Nemoto and Takao Shimizu and Yasuhiko Imai and Hiroshi Uchida and Osami Sakata and Hiroshi Funakubo},
  title = {Time Response of Crystal Structure in Tetragonal Pb(Zr,Ti)O3 Films Under an Applied Electric Field},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771549,
  author = {清水荘雄 and 三村和仙 and 舟窪浩},
  title = {HfO2基強誘電体エピタキシャル薄膜研究の最近の進展},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771533,
  author = {Y. Hiranaga and T. Mimura and T. Shimizu and H. Funakubo and Y. Cho},
  title = {Ferroelectric Probe Data Storage Using HfO2-Based Thin-Film Recording Media},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771532,
  author = {Y. Hiranaga and T. Mimura and T. Shimizu and H. Funakubo and Y. Cho},
  title = {Dynamic Observation of Nanoscale Domain Switching Behaviors in Ferroelectric HfO2 films Using Scanning Nonlinear Dielectric Microscopy},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771521,
  author = {Takanori Mimura and Kiriha Katayama and Takao Shimizu and Takanori Kiguchi and Akihiko Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Stability of Ferroelectric Phase in Epitaxial HfO2-based Films},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100769857,
  author = {Hiroshi Funakubo and Takao Shimizu and Kiliha Katayama and Takanori Mimura and Takanori Kiguchi and Takahisa Shiraishi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata},
  title = {Phase stability and Property design in HfO2-based ferroelectric thin films},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100771554,
  author = {平永良臣 and 三村和仙 and 清水荘雄 and 舟窪浩 and 長康雄},
  title = {SNDMによる分極反転過程の動的観察},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748229,
  author = {佐藤智也 and 一ノ瀬大地 and 三村和仙 and 根本祐一 and 清水荘雄 and 今井康彦 and 内田寛 and 坂田修身 and 舟窪浩},
  title = {電界印加下における正方晶Pb(Zr,Ti)O3膜の結晶構造の時間応答},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748234,
  author = {三村和仙 and 片山きりは and 清水荘雄 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪浩},
  title = {エピタキシャルHfO2基膜における強誘電相の安定性 -RE2O3-HfO2 vs ZrO2-HfO2-},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748233,
  author = {鈴木大生 and 三村和仙 and 清水荘雄 and 内田寛 and 舟窪浩},
  title = {スパッタリング法によるY2O3-HfO2強誘電体エピタキシャル薄膜作製とその評価},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748231,
  author = {平永良臣 and 三村和仙 and 清水 荘雄 and 舟窪浩 and 長康雄},
  title = {走査型非線形誘電率顕微鏡を用いたナノスケール分極反転過程の動的観察},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748227,
  author = {鈴木大生 and 三村和仙 and 清水荘雄 and 内田寛 and 舟窪浩},
  title = {Y2O3-HfO2エピタキシャル薄膜の構成相の決定因子},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748219,
  author = {平永良臣 and 長康雄 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {Y添加HfO2薄膜における強誘電ドメイン反転のSNDM観察},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100744316,
  author = {Hiroshi Funakubo and Takanori Mimura and Takao Shimizu and Kiliha Katayama and Hiroshi Uchida and Takanori Kiguchi and Akihiro Akama and Toyohiko Konno and Osami Sakata},
  title = {Orientation Controlled HfO2-Based Ferroelectric Films Prepared by Solid Phase Local Epitaxial Technique for High Density Memory Applications},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100748202,
  author = {Takao Shimizu and Kiliha Katayama and Takanori Mimura and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Epitaxial Growth of Ferroelectric HfO2-based films},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100748177,
  author = {三村和仙 and 清水荘雄 and 内田寛 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪 浩},
  title = {HfO2基強誘電体の結晶構造と特性の熱処理温度依存性},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100748175,
  author = {清水荘雄 and 三村和仙 and 片山きりは and 木口賢紀 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪浩},
  title = {電界印加によるYO1.5-HfO2基薄膜の結晶構造変化},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100748172,
  author = {清水荘雄 and 片山きりは and 三村和仙 and 木口賢紀 and 白石貴久 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪浩},
  title = {エピタキシャルおよび配向性YドープHfO₂薄膜の強誘電性},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100746492,
  author = {Z. Chen and Y. Hiranaga and T. Shimizu and K. Katayama and T. Mimura and H. Funakubo and Y. Cho},
  title = {Ferroelectric nanodomain observation in yttrium-doped HfO2 using scanning nonlinear dielectric microscopy},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100745092,
  author = {T. Sato and T. Kiguchi and T.J. Konno and J. Kimura and D. Ichinose and T. Mimura and H. Funakubo and K. Uchiyama},
  title = {Growth of {110}-oriented Perovskite-type Proton Conductive Oxide Thin Films by RF Magnetron Sputtering Method},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100745108,
  author = {Takao Shimizu and Kiliha Katayama and Takanori Mimura and Takanori Kiguchi and Takahisa Shiraishi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Ferroelectricity in epitaxial and well-oriented texutured Y-doped HfO2 films},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100745091,
  author = {三村和仙 and 舟窪浩},
  title = {ポストアニール法による配向制御したHfO2基強誘電体の作成とその特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100744306,
  author = {Hiroshi Funakubo and Takanori Mimura and Kiriha Katayama and Takao Shimizu and Hiroshi Uchida and Takanori Kiguchi and Akihiro Akama and Toyohiko Konno and Osami Sakata},
  title = {Growth of Orientation-Controlled Ferroelectric HfO2 Thin Films for Next Generation Ferroelectric Devices},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100744804,
  author = {Takanori Mimura and Kiriha Katayama and Takao Shimizu and Hiroshi Uchida and Takanori Kiguchi and Akihiro Akama and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Growth of orientation-controlled ferroelectric HfO2 thin films by solid phase crystallization and their characterization},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100744319,
  author = {舟窪 浩 and 清水荘雄 and 片山きりは and 三村和仙},
  title = {配向制御したHfO2基強誘電体薄膜の作製と特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100744340,
  author = {内山潔 and 佐藤智也 and 一ノ瀬大地 and 木村純一 and 井上貴明 and 三村和仙 and 舟窪浩},
  title = {Pt/Si基板上への{110}高配向ぺロブスカイト薄膜の直接成膜},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100721043,
  author = {舟窪浩 and 清水荘雄 and 片山きりは and 三村和仙 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 内田寛},
  title = {配向制御したHfO2基強誘電体の作製とその強誘電特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722311,
  author = {三村和仙 and 片山きりは and 清水荘雄 and 内田 寛 and 木口賢紀 and 赤間章裕 and 今野豊彦 and 坂田修身 and 舟窪 浩},
  title = {固相成長による配向制御したHfO2基強誘電体薄膜の作製と特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722305,
  author = {佐藤智也 and 木村純一 and 一ノ瀬大地 and 三村和仙 and 舟窪 浩 and 内山 潔},
  title = {{110}一軸配向ペロブスカイト型酸化物薄膜の作製と結晶構造解析},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722299,
  author = {陳 舟 and 平永良臣 and 清水荘雄 and 片山きりは and 三村和仙 and 舟窪 浩 and 長 康雄},
  title = {走査型非線形誘電率顕微鏡における強誘電性Y:HfO2薄膜のドメイン反転},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722208,
  author = {三村和仙 and 片山きりは and 清水荘雄 and 舟窪浩 and 内田寛 and 木口賢紀 and 赤間章裕 and 今野豊彦},
  title = {固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100722288,
  author = {陳舟 and 平永良臣 and 清水荘雄 and 片山きりは and 三村和仙 and 舟窪浩 and 長康雄},
  title = {強誘電性Y:HfO2薄膜におけるナノスケールドメイン反転},
  booktitle = {},
  year = 2016,
}

@misc{CTT100876024,
  author = {清水 荘雄 and 三村 和仙 and 舟窪 浩},
  title = {HfO2基材料における強誘電性の発現機構},
  year = 2021,
}

@misc{CTT100836447,
  author = {三村和仙 and 志村礼司郎 and 舟窪浩 and 清水荘雄},
  title = {HfO2およびZrO2基強誘電体膜の厚膜化と室温合成},
  year = 2020,
}

@misc{CTT100836458,
  author = {三村和仙 and 清水荘雄 and 舟窪浩},
  title = {蛍石構造強誘電体薄膜の組成による結晶構造変化の観察},
  year = 2019,
}

@misc{CTT100857770,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  year = 2020,
}

@misc{CTT100818059,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  year = 2020,
}

@misc{CTT100818062,
  author = {三村和仙},
  title = {エピタキシャル成長したHfO2基薄膜を用いた強誘電相出現に関する研究},
  year = 2020,
}

@misc{CTT100818063,
  author = {三村和仙},
  title = {エピタキシャル成長したHfO2基薄膜を用いた強誘電相出現に関する研究},
  year = 2020,
}

@misc{CTT100869586,
  author = {舟窪浩 and 清水荘雄 and 三村和仙 and 中村　美子 and 志村　礼司郎 and 田代裕貴},
  title = {強誘電性膜の製造方法、強誘電性膜、及びその用途},
  howpublished = {公開特許},
  year = 2020,
  month  = {},
  note   = {PCT/JP2020/018031(2020/04/27), WO 2020/218617(2020/10/29)}
}


@misc{CTT100828285,
  author = {舟窪浩 and 清水荘雄 and 三村和仙 and 志村　礼司郎 and 井上　ゆか梨 and 佐藤　祐介},
  title = {強誘電性薄膜、強誘電性薄膜素子、圧電アクチュエータ、圧電センサ、ヘッドアセンブリ、ヘッドスタックアセンブリ、ハードディスクドライブ、プリンタヘッド、及びインクジェットプリンタ装置},
  howpublished = {登録特許},
  year = 2022,
  month  = {},
  note   = {特願2018-163377(2018/08/31), 特開2020-033629(2020/03/05), 特許第7061752号(2022/04/21)}
}


@misc{CTT100753371,
  author = {清水荘雄 and 舟窪浩 and 片山きりは and 三村和仙},
  title = {強誘電性薄膜、電子素子及び製造方法},
  howpublished = {登録特許},
  year = 2020,
  month  = {},
  note   = {特願2016-545654(2015/08/28), 再表2016/031986(2017/06/15), 特許第6661197号(2020/02/14)}
}




@phdthesis{CTT100857770,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  school = {東京工業大学},
  year = 2020,
}

@phdthesis{CTT100818059,
  author = {Takanori Mimura},
  title = {A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films},
  school = {東京工業大学},
  year = 2020,
}

@phdthesis{CTT100818062,
  author = {三村和仙},
  title = {エピタキシャル成長したHfO2基薄膜を用いた強誘電相出現に関する研究},
  school = {東京工業大学},
  year = 2020,
}

@phdthesis{CTT100818063,
  author = {三村和仙},
  title = {エピタキシャル成長したHfO2基薄膜を用いた強誘電相出現に関する研究},
  school = {東京工業大学},
  year = 2020,
}