論文

• Takanori Mimura, Reijiro Shimura, Akinori Tateyama, Yoshiko Nakamura, Takahisa Shiraishi, Hiroshi Funakubo. No-Heating deposition of ferroelectric x%Y-doped (100–x%)(Hf1−yZry)O2 films, Phys. Status Solidi A, 2023, 2300100-1-6, May 2023.
• Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takahisa Shiraishi, Takao Shimizu, Tomoaki Yamada, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo. No-Heating Deposition of 1-μm-Thick Y-Doped HfO2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method, Phys. Status Solidi RRL, Early View, Jan. 2022.
• Shinya Kondo, Reijiro Shimura, Takashi Teranishi, Akira Kishimoto, Takanori Nagasaki, Hiroshi Funakubo, Tomoaki Yamada. Influence of orientation on electro-optic effect in epitaxial Y-doped HfO2 ferroelectric thin films, Jpn. J. Appl. Phys., Vol. 60, pp. SFFB13-1-5, Aug. 2021.
• Shinya Kondo, Reijiro Shimura, Takashi Teranishi, Akira Kishimoto, Takanori Nagasaki, Hiroshi Funakubo, Tomoaki Yamada. Linear electro-optic effect in CMOS-compatible ferroelectric HfO2-based epitaxial thin films, Jpn. J. Appl. Phys. RAPID COMMUNICATION, Vol. 60, pp. 070905, June 2021.
• Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takao Shimizu, Tomoaki Yamada, Hiroshi Funakubo. Preparation of 1 μm-thick Y-doped HfO2 ferroelectric films on (111)Pt/TiOx/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties, Jpn. J. Appl. Phys., vol. 60, pp. 031009, Mar. 2021.
• Reijiro Shimura, Takanori Mimura, Takao Shimizu, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo. Preparation of near-1-μm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by an RF magnetron sputtering method, J.Ceram. Soc. Jpn, vol. 128, no. 8, pp. 539-543, Aug. 2020.
• P. T. Tue, Reijiro Shimura, T. Shimoda, Yuzuru Yakamura. Direct integration of piezo-actuator array with active-matrix oxide thin-film transistors using a low-temperature solution process, Sensors and Actuators A: Physical, Vol. 295, pp. 125-132, May 2019.
• Phan Trong Tue, Reijiro Shimura, Kazuhiro Fukada, Keisuke Satou, Jinwang Li, Tatsuya Shimoda, Yuzuru Takamura. EFFECT OF ULTRAVIOLET/OZONE TREATMENT ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF SOLUTION-PROCESSED PIEZOELECTRIC THICK-FILM LEAD-ZIRCONIUM-TITANATE (PZT), International Journal of Nanotechnology, Inderscience, Vol. 15, pp. 69-77, Jan. 2018.

国際会議発表 (査読なし・不明)

• Hiroshi Funakubo, Yuma Takahashi, Takahisa Shiraishi, Kodera Masanori, Reijiro Shimura, Takanori Mimura, Keisuke Ishihama, Kazuki Okamoto, Hiroki Moriwake, Ayako Taguchi, Takao Shimizu, Yasuhiro Fujii, Akitoshi Koreeda. Stabilization and Identification of Ferroelectric HfO2 Thin Films, IWDTF2023 (2023 International Workshop on Dielectric Thin Films for Future Electron Devices - Science and Technology), Oct. 2023.
• Shinya Kondo, Reijiro Shimura, Takashi Teranishi, Akira Kishimoto, Takanori Nagasaki, Hiroshi Funakubo, Tomoaki Yamada. Electro-optic properties in ferroelectric HfO2-based epitaxial thin films, MRM 2021 (Materials Research Meeting 2021), Dec. 2021.
• Funakubo, H., Shimura, R., Mimura, T., Tateyama, A., Nakamura, Y., Shimizu, T., Yamada, T., Tanaka, Y., Inoue, Y.. Low temperature preparation of thick Y-HfO2 ferroelectric films, E-MRS (2021 Fall Meeting of the European Materials Research Society), Sept. 2021.
• Hiroshi Funakubo, Takanori Mimura, Reijiro Shimura, Yoshiko Nakamura, Takao Shimizu. Stability and Room Temperature Deposition of Ferroelectric Phase in Y-Doped (Hf, Zr)O2 Films, 2021 Virtual MRS Spring Meeting & Exhibit, Apr. 2021.

国内会議発表 (査読なし・不明)

• 高橋雄真, 白石貴久, 小寺正徳, 志村礼司郎, 三村和仙, 森分博紀, 田口綾子, 舟窪浩. HfO2基強誘電体膜のラマン分光測定, 第82回応用物理学会秋季学術講演会, Sept. 2021.
• 近藤真矢, 志村礼司郎, 寺西貴志, 岸本昭, 長崎正雅, 舟窪浩, 山田智明. Y添加HfO2強誘電体エピタキシャル薄膜の電気光学効果, 第82回応用物理学会秋季学術講演会, Sept. 2021.
• 近藤真矢, 志村礼司郎, 舟窪浩, 寺西貴志, 岸本昭, 山田智明. エピタキシャルHfO2基強誘電体薄膜の電気光学特性, 第38回強誘電体会議（FMA 38）, June 2021.
• 海老原凌, 吉田慎哉, 志村礼司郎, 舟窪浩, 田中秀治. Y2O3-HfO2強誘電体薄膜を搭載したMEMSユニモルフカンチレバーの作製と特性評価, 第68回応用物理学会春季学術講演会, Mar. 2021.
• 志村礼司郎, 三村和仙, 舘山明紀, 清水荘雄, 白石貴久, 舟窪浩. スパッタリング法によるY-HZO強誘電体厚膜の室温製膜とその電気特性および圧電特性評価, 第68回応用物理学会春季学術講演会, Mar. 2021.
• 志村礼司郎, 三村和仙, 舘山明紀, 清水荘雄, 舟窪浩. スパッタリング法によるHfO2基強誘電体厚膜のシリコン基板上への室温製膜とその電気特性および圧電特性評価, 第81回応用物理学会秋季学術講演会, Sept. 2020.
• 志村礼司郎, 三村和仙, 舘山明紀, 清水荘雄, 舟窪浩. スパッタリング法によるHfO2基強誘電体厚膜の室温製膜とその電気特性評価, 第67回応用物理学会春季学術講演会, Mar. 2020.
• 志村礼司郎, 三村和仙, 清水荘雄, 舟窪浩. スパッタリング法を用いたY:HfO2強誘電体厚膜の作製とその電気特性評価, 第39回電子材料研究討論会, Nov. 2019.
• 志村礼司郎, 三村和仙, 清水荘雄, 舟窪浩. スパッタリング法により配向制御したHfO2基強誘電体厚膜の作製およびその電気特性評価, 第66回応用物理学会春季学術講演会, Mar. 2019.
• 志村礼司郎, 三村和仙, 清水荘雄, 舟窪浩. スパッタリング法によるHfO2基強誘電体の厚膜化とその電気特性評価, 第79回応用物理学会秋季学術講演会, Sept. 2018.

その他の論文・著書など

• 三村和仙, 志村礼司郎, 舟窪浩, 清水荘雄. HfO2およびZrO2基強誘電体膜の厚膜化と室温合成, 超音波TECHNO, 2020年9-10号, 41-45, Sept. 2020.

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