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JiangFei 研究業績一覧 (6件)
- 2024
- 2023
- 2022
- 2021
- 2020
- 全件表示
国際会議発表 (査読有り)
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Osamu Sakuchi,
Fei Jiang,
Junzaburo Yamada,
Qiushi Zhu,
Masato Watanabe,
Tohru Kawamura,
Akitoshi Okino,
Kazuhiko Horioka,
Eiki Hotta.
Development of Xenon Gas-Jet Z-Pinch Discharge and Laser Triggered Tin Discharge Light Sources for EUV Lithography,
14th International Congress on Plasma Physics,
ICPP2008 Abstracts,
JSPF,
FG-P3-079,
p. 349,
Sept. 2008.
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Masato Watanabe,
Nozomu Kishi,
Junzaburo Yamada,
Osamu Sakuchi,
Jiang Fei,
Zhu Qiushi,
Akitoshi Okino,
Kazuhiko Horioka,
Eiki Hotta.
Experimental Study on Xenon and Tin Discharge Produced Plasma EUV Light Source,
The 35th IEEE International Conference on Plasma Science,
IEEE Conference Record Abstracts The 35th IEEE International Conference on Plasma Science,
IEEE,
1P67,
p. 170,
June 2008.
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Sakuchi Osamu,
Iizuka Naoya,
Jiang Fei,
Watanabe Masato,
Kawamura Tohru,
Okino Akitoshi,
Horioka Kazuhiko,
Hotta Eiki.
Development of a Gas Jet-Type Z-pinch Plasma Light Source for EUV Lithography,
The 25th Symposium on Plasma Processing (SPP-25),
Jan. 2008.
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MASATO WATANABE,
Nozomu Kishi,
Naoya Iizuka,
Shinya Orishimo,
Fei Jiang,
AKITOSHI OKINO,
EIKI HOTTA.
Optical Observation of Gas Jet Z-Pinch Discharge Produced Extreme Ultraviolet Light Source,
16th IEEE International Pulsed Power Conference,
IEEE,
pp. 1679-1682,
Nov. 2007.
公式リンク
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Masato Watanabe,
Nozomu Kishi,
Jiang Fei,
Akitoshi Okino,
Bong-Seong Kim,
Kwang-Cheol Ko,
Kazuhiko Horioka,
Eiki Hotta.
Development of Xe and Sn Discharge Produced Plasma Light Source for EUV Lithography,
2007 International EUVL Symposium,
SEMATECH,
pp. SO-P01,
Oct. 2007.
国内会議発表 (査読有り)
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Bin Huang,
Bin Xie,
Fei Jiang,
Taku Tomizuka,
Yasuhiro Takimoto,
Masato Watanabe,
Feng Xiao,
Eiki Hotta.
Numerical study of the initial gas distribution on a gas jet plasma EUV source,
2011 Annual Conference of Fundamentals and Materials Society IEE Japan,
Proceedings of 2011 Annual Conference of Fundamentals and Materials Society IEE Japan,
IEE Japan,
CD,
Sept. 2011.
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