@article{CTT100910183, author = {Shasha Li and Shinsuke Miyajima}, title = {Demonstration of Excellent Crystalline Silicon Surface Passivation (S < 1.27 cm s−1) by High-Rate DC-Sputtered Hydrogenated Amorphous Silicon}, journal = {Solar RRL}, year = 2024, } @article{CTT100887722, author = {Noboru Yamaguchi and Shasha Li and Shinsuke Miyajima}, title = {Characterization of tunnel oxide passivated contact fabricated by sputtering and ion implantation technique}, journal = {Japanese Journal of Applied Physics}, year = 2023, } @inproceedings{CTT100925580, author = {Shasha Li and Shinsuke Miyajima}, title = {[SP2-02] Can Sputtering Be Used as a High-Rate Deposition Technique for Surface Passivation Layer in Silicon Solar Cells?}, booktitle = {}, year = 2024, } @inproceedings{CTT100925589, author = {Shasha Li and Shinsuke Miyajima}, title = {[24p-12M-8] Optimization of i-a-Si:H passivation process by DC facing target sputtering deposition}, booktitle = {}, year = 2024, } @inproceedings{CTT100925588, author = {山口 昇 and Li Shasha and 宮島 晋介}, title = {[25a-P05-4] スパッタおよびイオン注入を用いた高品質(τeff > 10 ms) TOPCon構造の作製}, booktitle = {}, year = 2024, } @inproceedings{CTT100906080, author = {Shasha Li and Yasushi Kawaguchi and Shinsuke Miyajima}, title = {(5ThP.21) Tunnel Oxide Passivated Contacts Using Sputtered Amorphous Silicon and Spin-On-Doping}, booktitle = {}, year = 2023, } @inproceedings{CTT100906071, author = {Shasha Li and Shinsuke Miyajima}, title = {(Area5 5TuO5-3) Impact of DC Power on Passivation Quality of Intrinsic Amorphous Silicon Deposited by Facing Target Sputtering}, booktitle = {}, year = 2023, } @inproceedings{CTT100918415, author = {Shasha Li and Shinsuke Miyajima}, title = {[20p-D901-2] Comparing Pulsed DC and Constant DC Facing Target Sputtering of Hydrogenated Intrinsic Amorphous Silicon for High-Quality Surface Passivation of Silicon}, booktitle = {}, year = 2023, } @inproceedings{CTT100887721, author = {ShaSha Li and Shinsuke Miyajima}, title = {[17a-PA05-5] Optimization of 2-step deposition process of i-a-Si:H passivation layer deposited by facing target sputtering}, booktitle = {}, year = 2023, }