論文

• M. A. Sulthoni, T. Kodera, Y. Kawano, S. Oda. Optimization and Tunnel Junction Parameters Extraction of Electro-statically Defined Silicon Double Quantum Dots Structure, Japanese Journal of Applied Physics, Vol. 52, pp. 081301 (5 pages), July 2013.
• M. A. Sulthoni, T. Kodera, Y. Kawano, S. Oda. A Multi-purpose Electrostatically Defined Silicon Quantum Dots, Jpn. J. Appl. Phys, Vol. 51, No. 2, pp. 02BJ10-1-4, May 2012.
• Muhammad Amin Sulthoni, Tetsuo Kodera, Yukio Kawano, Shunri Oda. A Multi-Purpose Electrostatically Defined Silicon Quantum Dot Structure, Japanese Journal of Applied Physics, Vol. 51, pp. 02BJ10 (4 pages), Feb. 2012.
• M. A. Sulthoni, T. Kodera, K. Uchida, S. Oda. Numerical simulation study of electrostatically defined silicon double quantum dot device, J. Appl. Phys., Vol. 110, pp. 054511 -1-4, Aug. 2011.

国際会議発表 (査読有り)

• Muhammad Amin Sulthoni, Tetsuo Kodera, Yukio Kawano, Shunri Oda. Transport Simulation of an Electrostatically Defined Silicon Double Quantum Dot Device, G-COE PICE International Symposium and IEEE EDS Minicolloquium on Advanced Hybrid Nano Devices: Prospects by World’s Leading Scientists, P-2, Oct. 2011.
• M. A. Sulthoni, T. Kodera, Y. Kawano, S. Oda. A Multi-purpose Electrostatically Defi ned Silicon Quantum Dot Structure, Solid State Devices and Materials Conference, Extended Abstracts, P-9-7, Sept. 2011.
• Muhammad Amin Sulthoni, Tetsuo Kodera, Ken Uchida, Shunri Oda. Simulation Study of Electrostatically Defined Silicon Double Quantum Dot Device, IEEE Silicon Nanoelectronics Workshop, No. 5-12, June 2011.
• Muhammad Amin Sulthoni, Tetsuo Kodera, Ken Uchida, Shunri Oda. Preparation of SOI-based Double Quantum Dots Structure Defined by Geometry and Electrostatically, Solid State Devices and Materials Conference, Extended Abstracts, Sept. 2010.

国内会議発表 (査読なし・不明)

• SulthoniMuhammad Amin, 小寺哲夫, 蒲原知宏, 河野行雄, 小田俊理. 単層ゲートによるシリコン2重量子ドット形成のシミュレーション, 2012年春季第59回応用物理学関係連合学術講演会, 18a-GP6-10, Mar. 2013.
• Muhammad Amin Sulthoni, Tetsuo Kodera, Ken Uchida, Syunri Oda. Simulation of silicon double quantum dots device fabricated by combining lithographical and electrostatical approaches, 第57回応用物理学関係連合講演会, 19a-B-4, Mar. 2010.

[ BibTeX 形式で保存 ]    [ 論文・著書をCSV形式で保存 ]    [ 特許をCSV形式で保存 ]