論文

• Y. Saito, T. Higashihara, M. Ueda. Direct Photo-Patterning of Poly(3-Hexylthiophene)., J Photopolym Sci Tech, Vol. 24, No. 3, p. 273-276, 2011.
• Y. Saito, K. Mizoguchi, T. Higashihara, M. Ueda. Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator, J. Appl. Polym. Sci., Vol. 113, pp. 3605-3611, July 2009.
• yuta saito, tomoya higashihara, mitsuru ueda. Highly refractive and photosensitive polyimide, Vol. 22, pp. 423-428, July 2009.
• Yuta Saito, Kazuya Matsumoto, T. Higashihara, mitsuru ueda. A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator, Chem. Lett, Vol. 38, pp. 1048-1049, July 2009.
• yuta saito, katsuhisa mizoguchi, mitsuru ueda. Negative-type Chemically Amplified Photosensitive Novolac, J. Photopolym. Sci.＆Technol, Vol. 21, pp. 161-164, 2008.

国際会議発表 (査読有り)

• Yuta Saito, Tomoya Higashihara, Mitsuru Ueda. Direct Patterning of Regioregular Poly(3-hexylthiophene), European Polymer Congress 2011, Aug. 2012.
• Yuta Saito, Katsuhisa Mizoguchi, Tomoya Higashihara, Mitsuru Ueda. Negative-type Chemically Amplified Photosensitive Novolac, Macro 2008, June 2008.

国内会議発表 (査読有り)

• 齋藤 悠太, 酒井 良正, 東原 知哉, 上田 充. 感光性を有する高誘電率ゲート絶縁材料, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 1511, May 2011.
• 齋藤 悠太, 溝口 勝久, 上田 充. 高感度なネガ型ノボラック樹脂系レジストの開発, 第57回高分子年次大会, May 2008.

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